Published online by Cambridge University Press: 26 February 2011
Ab-initio calculations using the Vienna ab-initio simulation package (VASP) were performed for a high Nb bearing γ TiAl based alloy with a composition of Ti-46at.%Al-9at.%Nb in order to evaluate the effect of Nb on the crystal structure. The calculations revealed that upon doping with Nb the resulting structure can have Ti and Nb atoms on Al-sites, which leads to a reduction of the c/a ratio of the tetragonal γ TiAl cell to ~1.In contrast, the c/a ratio is increased, compared to the binary phase, if the Nb atoms occupy solely Ti sites and if Ti antisite defects (i.e. Ti on the Al sublattice) are formed. The relaxed structure models were used to perform high-resolution transmission electron microscopy (HRTEM) and high-angle annular dark field scanning transmission electron microscopy (HAADF-STEM) image simulations. The results showed that the positions of the Nb atoms should be detectable by these high spatial resolution methods, although it might be easier by HAADF-STEM investigations due to the stronger dependence of the signal on the atomic number Z.