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Studies of Organometallic Precursors to Aluminum Nitride

Published online by Cambridge University Press:  28 February 2011

Leonard V. Interrante ,
Leslie E. Carpenter II ,
Christopher Whitmarsh ,
Wei Lee ,
Mary Garbauskas  and
Glen A. Slack
Leonard V. Interrante
Affiliation:
Dept. of Chemistry, Rensselaer Polytechnic Institute, Troy, NY 12180–3590
Leslie E. Carpenter II
Affiliation:
Dept. of Chemistry, Rensselaer Polytechnic Institute, Troy, NY 12180–3590
Christopher Whitmarsh
Affiliation:
Dept. of Chemistry, Rensselaer Polytechnic Institute, Troy, NY 12180–3590
Wei Lee
Affiliation:
Dept. of Chemistry, Rensselaer Polytechnic Institute, Troy, NY 12180–3590
Mary Garbauskas
Affiliation:
General Electric Corporate Research and Development, P.O. Box 8, Schenectady, NY 12301.
Glen A. Slack
Affiliation:
General Electric Corporate Research and Development, P.O. Box 8, Schenectady, NY 12301.
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Abstract

The reaction of trialkylaluminum compounds with ammonia has been examined as a potential route to high purity AlN powder and to AlN thin films. This reaction proceeds in stages in which the initially formed Lewis acid/base adduct undergoes thermal decomposition to a series of intermediate alkylaluminum-amide and -imide species with increasing Al-N bonding, i.e.,

The structure and properties of several of these species have been studied using various physical and chemical methods, leading to a better understanding of the chemistry of this novel AlN precursor system. The structure of the intermediate organoaluminum amide, (CH3)2AlNH2, has been determined by single crystal X-ray diffraction methods and found to contain molecular trimer units with a six-membered Al-N ring structure similar to those which make up the wurzite structure of AlN. This compound is readily volatile and has been used to deposit AIN thin films on Si surfaces by a low-pressure CVD process. This approach has also been used to prepare AlN as a high surface area, high purity powder.

Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 73: Symposium H – Better Ceramics Through Chemistry II , 1986 , 359
Copyright
Copyright © Materials Research Society 1986

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References

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