Hostname: page-component-78c5997874-dh8gc Total loading time: 0 Render date: 2024-11-13T02:47:37.257Z Has data issue: false hasContentIssue false

Synthesis, Characterization, and Growth Mechanism of Silicon Oxide Nanowires

Published online by Cambridge University Press:  15 February 2011

Lifeng Dong
Affiliation:
Department of Physics, Portland State University, Portland, OR 97201
Michael Coulter
Affiliation:
Harvard University, Cambridge, MA 02138
Ford
Affiliation:
Department of Chemical Engineering, Oregon State University, Corvallis, OR 97331
Jun Jiao
Affiliation:
Department of Physics, Portland State University, Portland, OR 97201
Get access

Abstract

Two fabrication methods have been investigated to synthesize silicon oxide nanowires. One was catalytic thermal evaporation method in which silicon monoxide was used as the precursor and Au particles served as the catalysts. Using nanosphere lithography, patterned nanowires were obtained and their growth positions were controlled by the locations of Au catalysts. For the second method, without silicon monoxide as the precursor and without the aid of Au catalyst, silicon oxide nanowires directly formed along the <110> direction of the silicon substrate only with the introduction of hydrogen gas. A series of experiments were carried out to study effects of reaction time, temperature, and hydrogen on the growth of the nanowires. Also, various electron microscopy techniques were utilized to characterize their morphologies and internal structures and to analyze their compositional distributions. In this paper, the characterization of different silicon oxide nanowires and their formation mechanisms in relation to both preparation methods are discussed.

Type
Research Article
Copyright
Copyright © Materials Research Society 2005

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Hu, J. Q., Jiang, Y., Meng, X. M., Lee, C. S., Lee, S. T., Chem. Phys. Lett. 367, 339 (2003).Google Scholar
2. Zheng, B., Wu, Y. Y., Yang, P. D., Liu, J., Adv. Mater. 14, 122 (2002).Google Scholar
3. Yu, D. P., Hang, Q. L., Ding, Y., Zhang, H. Z., Bai, Z. G., Wang, J. J., Zou, Y. H., Qian, W., Xiong, G. C., Feng, S. Q., Appl. Phys. Lett. 73, 3076 (1998).Google Scholar
4. Hulteen, J. C., Duyne, R. P. Van, J. Vac. Sci. Technol. A 13, 1553 (1995).Google Scholar
5. Wagner, R. S., Ellis, W. C., Appl. Phys. Lett. 4, 89 (1964).Google Scholar
6. Dong, L. F., Jiao, J., Tuggle, D. W., Petty, J. M., Elliff, S. A., Coulter, M., Appl. Phys. Lett. 82, 1096 (2003)Google Scholar
7. Dong, L. F., Jiao, J., Coulter, M., Love, L., Chem. Phys. Lett. 376, 653 (2003).Google Scholar
8. Dong, L. F., Jiao, J., Microsc. Microanal. 11, 116 (2005).Google Scholar
9. Shimura, F., Semiconductor Silicon Crystal Technology (Academic Press, San Diego, 1988).Google Scholar
10. Capaz, R. B., Cassali, L. V., Kimerling, L. C., Cho, K., Joannopoulos, J. D., Phys. Rev. B 59, 4898 (1999).Google Scholar
11. Wei, Y., Li, L., Tsong, L. S., Appl. Phys. Lett. 66, 1818 (1995).Google Scholar