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Thermal stability of nickel-cobalt multilayer silicide

Published online by Cambridge University Press:  01 February 2011

Kil Jin Han ,
Yu Jung Cho ,
Soon Young Oh ,
Yong Jin Kim ,
Won Jae Lee ,
Hi Deok Lee  and
Yeong-Cheol Kim
Kil Jin Han
Affiliation:
kiljin1223@nate.com, Korea University of Technology and Education, Material engineering, Ga Jeon, Cheon-An, Chung nam, 330708, Korea, Republic of
Yu Jung Cho
Affiliation:
kiljin1223@nate.com, Korea, Republic of
Soon Young Oh
Affiliation:
kiljin1223@nate.com, Chungnam National University, Electronics Engineering, Korea, Republic of
Yong Jin Kim
Affiliation:
kiljin1223@nate.com, Korea, Republic of
Won Jae Lee
Affiliation:
kiljin1223@nate.com, Korea, Republic of
Hi Deok Lee
Affiliation:
kiljin1223@nate.com, Korea, Republic of
Yeong-Cheol Kim
Affiliation:
yckim@kut.ac.kr, Korea, Republic of
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Abstract

In this study, we have investigated the structure of nickel-cobalt silicide to understand its behavior at high temperature. Nickel-cobalt silicide was formed after two-step RTP at 500°C and 700°C respectively. We could observe by TEM that nickel-cobalt silicide consists of a structure which seems to be a Ni-Co-Si ternary phase. No nickel silicide phases and cobalt silicide phases were detected in nickel-cobalt silicide by XRD. From XPS depth profile, we could confirm that there is a cobalt composition gradient along the silicide.

Keywords

transmission electron microscopy (TEM)phase transformationx-ray diffraction (XRD)
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 891: Symposium EE – Progress in Semiconductor Materials V – Novel Materials and Electronics and Optoelectronic Applications , 2005 , 0891-EE07-29
Copyright
Copyright © Materials Research Society 2006

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References

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