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Thin Film Metal Oxide Semiconductors Deposited on Polymeric Substrates

Published online by Cambridge University Press:  21 March 2011

Elvira Fortunato ,
Patrícia Nunes ,
António Marques ,
Daniel Costa ,
Hugo Águas ,
Isabel Ferreira ,
Maria E. V. Costa  and
Rodrigo Martins
Elvira Fortunato
Affiliation:
Department of Materials Science/CENIMAT, Faculty of Sciences and Technology, New University of Lisbon and CEMOP-UNINOVA, 2825-114 Caparica, Portugal
Patrícia Nunes
Affiliation:
Department of Materials Science/CENIMAT, Faculty of Sciences and Technology, New University of Lisbon and CEMOP-UNINOVA, 2825-114 Caparica, Portugal
António Marques
Affiliation:
Department of Materials Science/CENIMAT, Faculty of Sciences and Technology, New University of Lisbon and CEMOP-UNINOVA, 2825-114 Caparica, Portugal
Daniel Costa
Affiliation:
Department of Materials Science/CENIMAT, Faculty of Sciences and Technology, New University of Lisbon and CEMOP-UNINOVA, 2825-114 Caparica, Portugal
Hugo Águas
Affiliation:
Department of Materials Science/CENIMAT, Faculty of Sciences and Technology, New University of Lisbon and CEMOP-UNINOVA, 2825-114 Caparica, Portugal
Isabel Ferreira
Affiliation:
Department of Materials Science/CENIMAT, Faculty of Sciences and Technology, New University of Lisbon and CEMOP-UNINOVA, 2825-114 Caparica, Portugal
Maria E. V. Costa
Affiliation:
Department of Ceramics and Glass Engineering/UIMC, University of Aveiro, 3810-193 Aveiro Portugal
Rodrigo Martins
Affiliation:
Department of Materials Science/CENIMAT, Faculty of Sciences and Technology, New University of Lisbon and CEMOP-UNINOVA, 2825-114 Caparica, Portugal
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Abstract

Highly textured transparent conducting ZnO:Al thin films have been prepared by r.f. magnetron sputtering. The films were deposited on polyester (Mylar type D, 100 µm thickness) and glass substrates at room temperature. Surface stylus profiling, X-ray diffraction, scanning electron microscopy, transmission electron microscope and Hall effect measurements as a function of temperature have been used to characterize the produced films. The samples are polycrystalline with a hexagonal wurtzite structure and a strong crystallographic c-axis orientation (002) perpendicular to the substrate surface (columnar structure). The ZnO:Al thin films with a resistivity as low as 3.6×10−2 µcm have been obtained, as deposited.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 666: Symposium F – Transport and Microstructural Phenomena , 2001 , F11.3
Copyright
Copyright © Materials Research Society 2001

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References

REFERENCES

[1] Hartnagel, H.L., Dawar, A.L., Jain, A.K., Jagadish, C., “Semiconducting Transparent Thin Films” (IOP, 1995).Google Scholar
[2] Han, B.M., Chang, S., Kim, S.Y., Thin Solid Films 338, 265 (1999).Google Scholar
[3] Park, K.C., Ma, D.Y., Kim, K.H., Thin Solid Films 305, 201 (1997).Google Scholar
[4] Hu, J., Gordon, R.G., J. Appl. Phys. 71, 880 (1992).Google Scholar
[5] Kim, J.S., Marzouk, H.A., Reucroft, P.J., Hamrin, C.E., Thin Solid Films 217, 133 (1992).Google Scholar
[6] Miki-Yoshida, M., Paraguay-Delgado, F., pez, W. Estrada-Ló, Andrade, E., Thin Solid Films 376, 99 (2000).Google Scholar
[7] Nunes, P., Fernandes, B., Fortunato, E., Vilarinho, P., Martins, R., Thin Solid Films 337, 176 (1999).Google Scholar
[8] Shuler, T., Aegerter, M.A., Thin Solid Films 351, 125 (1999).Google Scholar
[9] Ohyama, M., Kozuka, H., Yoko, T., J. Am. Ceram. Soc. 81, 1622 (1998).Google Scholar
[10] Ritala, M., Asikanen, T., Leskelä, M., Skarp, J., Mater. Res. Soc. Symp. Proc. 426, 497 (1996).Google Scholar
[11] Hayamizu, S., Tabata, H., Tanaka, H., Kawai, T., J. Appl. Phys. 80, 787 (1996).Google Scholar
[12] Zhang, D.H., Yang, T.L., Ma, J., Wang, Q.P., Gao, R.W., Ma, H.L., Applied Surface Science 158, 43 (2000).Google Scholar
[13] Gates, S.M., Mat. Res. Soc. Symp. Proc., 467 (1997) 843.Google Scholar
[14] Fortunato, E., Brida, D., Ferreira, I., Águas, H., Nunes, P., Martins, R., Thin Solid Films 383 (2001) 310.Google Scholar
[15] Nunes, P., Costa, D., Fortunato, E., Martins, R.: Vacuum (2001), in print.Google Scholar
[16] http://www.dupontteijinfilms.comGoogle Scholar
[17] Yoshino, Y., Inoue, K., Takeuchi, M., Makino, T., Katayama, Y., Hata, T., Vacuum 59, 403 (2000).Google Scholar
[18] Williams, D.B., Carter, C.B., “Transmission Electron Microscopy” (Plenum Press, 1996).Google Scholar