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Thin Film of Conjugated Schiff-Base as Ultrahigh Density Data Storage Material

Published online by Cambridge University Press:  10 February 2011

W. J. Yang
Affiliation:
College of Chemistry, Peking Univ., Beijing 100871, P.R.China
Q. C. Yang
Affiliation:
College of Chemistry, Peking Univ., Beijing 100871, P.R.China
H. G. Lu
Affiliation:
College of Chemistry, Peking Univ., Beijing 100871, P.R.China
H. Y. Chen*
Affiliation:
College of Chemistry, Peking Univ., Beijing 100871, P.R.China
S. M. Hou
Affiliation:
Department of Electronics, Peking Univ.Beijing 100871, P.R.China
L. P. Ma
Affiliation:
Beijing Laboratory of Vacuum Physics, Chinese Academy of Science, Beijing 100080, P.R.China
H. X. Zhang
Affiliation:
Beijing Laboratory of Vacuum Physics, Chinese Academy of Science, Beijing 100080, P.R.China
Z. Q. Xue
Affiliation:
Department of Electronics, Peking Univ.Beijing 100871, P.R.China
S. J. Pang
Affiliation:
Beijing Laboratory of Vacuum Physics, Chinese Academy of Science, Beijing 100080, P.R.China
*
*To whom the correspondence should be addressed.
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Abstract

N-(3-nitrobenzylidene)-p-phenylenediamine (NBPDA) was used as ultrahigh density data storage medium by scanning tunneling microscope (STM) technique. Data marks of 1.4nm in diameter were written by applying voltage pulses between the STM tip and the substrate. Structures of single crystal and thin films were characterized by IR, UV–Vis, XRD, STM and verified by DFT quantum chemical calculation.

Type
Research Article
Copyright
Copyright © Materials Research Society 1998

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