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Use of Optical Emission Spectroscopy as a Diagnostic Technique for Plasma Deposition of Hydrogenated Amorphous Silicon and Carbon

Published online by Cambridge University Press:  15 February 2011

F. J. Kampas
F. J. Kampas*
Affiliation:
Division of Metallurgy and Materials Science, Brookhaven National Laboratory, Upton, New York 11973
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Abstract

Optical emission intensities have been measured as a function of composition for silane-argon and silane-hydrogen mixtures used in the deposition of hydrogenated amorphous silicon. It was found that changes in silane fraction have a large effect on the electron concentration and energy distribution in the discharge.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 30: Symposium L – Plasma Processing and Synthesis of Materials I , 1983 , 291
Copyright
Copyright © Materials Research Society 1984

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References

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