Zinc oxide (ZnO) layers and nanowires were grown by chemical vapor deposition (CVD) using methane (CH4) as reducing agent. Compared to conventional CVD processes, which commonly use graphite powder to reduce the ZnO powder source material, this low-cost method allows an improved controllability of the growth processes. Specifically, the consumption of the source material–a commercially available ZnO powder–can be controlled in a very precise way by varying the flow of the reducing CH4 or the re-oxidizing O2. Using this parameter, the growth can be switched between ZnO layers and nanostructures. High-quality ZnO layers have been grown on gallium nitride (GaN) substrates and on c-plane sapphire with an intermediate aluminum nitride (AlN) nucleation layer. By adjusting the growth conditions accordingly, ZnO nanowires were also grown with this method catalyst-free using a- and c-plane sapphire with ZnO nucleation layer as a substrate. The optical properties of the nanowires were investigated by low-temperature photoluminescence (PL) and compared to samples grown by conventional carbo-thermal CVD.

This paper reviews our recent investigations of compound semiconductors and heterovalent interfaces using the technique of aberration-corrected scanning transmission electron microscopy. Bright-field imaging of compound semiconductors with a collection angle that is comparable in size to the incident-beam convergence angle is demonstrated to provide better atomic-column visibility for lighter elements in comparison with the more traditional high-angle annular-dark-field approach. Several pairs of Group II–VI/Group III–V compound semiconductors with zincblende structure have been studied in detail. These combinations are all valence-mismatched (i.e., heterovalent), and include CdTe/InSb (Δa/a ≤ 0.05%), ZnTe/InP (Δa/a = 3.8%), and ZnTe/GaAs (Δa/a = 7.4%). CdTe/InSb (001) interfaces are observed to be defect-free with a slight lattice contraction at the interface plane. For interfaces with larger lattice-parameter mismatch, the primary interfacial defects are identified as Lomer edge dislocations and perfect 60° dislocations. However, the atomic structure of the dislocation cores has not yet been unambiguously determined.

We analyze the effect of postdeposition annealing conditions on both the structure and the created defects in Zn0.90Co0.10O thin films, which deposited on the Si(100) substrates by the radio frequency magnetron sputtering technique using a homemade target. The dependence of the number and distribution of defects in homogeneously substituted Co+2 for Zn+2 ions in ZnO lattice on the annealing conditions is investigated. Orientations of thin films are in the [0002] direction with a surface roughness changing from 67 ± 2 nm to 25.8 ± 0.6 nm by annealing. The Co+2 ion substitution, changing from 7.5% ± 0.3% to 8.8 ± 0.3%, leads to the formation of Zn–O–Co bonds instead of Zn–O–Zn bonds and splitting of the Co 2p energy level to Co 2p1/2 and Co 2p3/2 with an energy difference of 15.67 ± 0.06 eV. The defects in the lattice are revealed from the correlations between Zn–O–Co bonds and intensity of the Raman peak at around 691 cm−1. In addition, the asymmetry changes of O 1s peak positions in the x-ray photoelectron spectra are in agreement with the Raman results.

Two kinds of type-II heterostructures (HSs) of ZnO (wurtzite)/ZnSe (wurtzite) [ZnO (WZ)/ZnSe (WZ)] and ZnO (wurtzite)/ZnSe (zinc blende) [ZnO (WZ)/ZnSe (ZB)] were designed for photovoltaic applications by first-principle calculations. The calculated effective bandgap of 1.51 eV for the ZnO (WZ)/ZnSe (WZ) HS is more favorable for solar cell applications compared to that of 1.69 eV for the ZnO (WZ)/ZnSe (ZB) HS. Furthermore, the electrons and holes are more effectively separated at the interface of ZnO (WZ)/ZnSe (WZ) HS due to the stronger misfit stress field. Finally, a strained ZB ZnSe layer was introduced to transport the separated holes from WZ ZnSe layer, and an optimal structure of ZnO (WZ)/ZnSe (WZ)/ZnSe (ZB) was proposed to realize a solar cell with near-infrared response.

To detect the relatively strong scattering signals of the Raman scattering and the x-ray diffraction (XRD) from CdS and those from the CdS/CdTe interface, an inverted CdTe solar cell structure was prepared and a 35-nm-thick CdS film was deposited on the surface of a CdTe solar cell structure. The Raman and high-resolution XRD scattering spectra allowed us to qualitatively study the interdiffusion and its related reactions at the CdS/CdTe interface. Interdiffusion began to occur at a relatively low temperature of about 350 °C, which coincided with the CdS phase transformation from cubic to hexagonal phase. Substantial interdiffusion of S and Te occurred after heat treatment at a temperature of 550 °C, resulting in formation of S-rich and Te-rich CdSxTe1−x alloy at the CdS/CdTe interface, with S and Te atomic concentration of ∼9% and 11% diffused into the CdTe and the CdS films, respectively.

Large-scale, well-aligned, and oriented ZnS nanorod arrays were fabricated by a novel and original template-free hydrothermal method. The ZnS nanorods were grown on the pulse-plating Zn nanocrystallines along a certain Zn crystalline direction. It was found that reaction factors such as hydrothermal reaction time, zinc source, and sulfide source concentration in the precursor solution, the acid–base property of the precursor solution, and the substrate where ZnS nanorod arrays were grown greatly influence the morphology of the final products. The growth mechanism of ZnS nanorod arrays was also studied. Pulse-plating Zn nanocrystallines were found to be essential for the growth of ZnS nanorod arrays. These ZnS nanorod arrays could be theoretically fabricated on almost any raw base plate as long as Zn nanocrystallines could be pulse-plated on it. Therefore, the as-synthesized ZnS nanorod array might be one of the promising candidates for field-emission or sensitive nanomaterials in the future.

We report the realization of the p-type conductivity and the enhancement of the photoluminescence (PL) intensity in undoped ZnO films treated with high-energy (1 MeV) electron-beam irradiation (HEEBI), suggesting that the HEEBI process is compatible with a low-temperature requirement for the fabrication of transparent thin film transistors with good efficiency on a plastic substrate. The p-type conductivity of the films was revealed by the Hall, x-ray photoelectron spectroscopy, and PL measurements after being electron-irradiated in air at room temperature. The major acceptor-like defects were determined to be oxygen interstitial and zinc vacancy. A model was proposed in terms of O as well as Zn diffusion to explain the observed results. It was also observed that HEEBI treatment has little influence on the optical transmittance of ZnO films, whereas HEEBI treatment shifts the optical band gap toward the lower energy region from 3.29 to 3.28 eV.