Frequency-modulated continuous-wave radar systems profit from increasing the absolute bandwidths of the generated frequency chirps to improve range resolution. As the relative bandwidth of SiGe-voltage-controlled oscillators (VCOs) is limited to about 80%, increasing the center frequency fundamentally or via frequency multiplication is the most direct way to increase that absolute bandwidth. However, as some applications require penetration depth, which dramatically decreases with frequency, other solutions are necessary. Therefore, state-of-the-art concepts rely on the down-conversion of generated frequency chirps via two separately stabilized frequency sources. This article implements a novel architecture, offering relative bandwidths of >100% within a single phase-locked loop (PLL). Therefore, two VCOs at different center frequencies are fed into a down-conversion mixer, whose output is directly stabilized via that PLL with one loop filter generating both tuning voltages. Those circuit blocks can be summarized as one equivalent VCO, offering a higher relative bandwidth and a significantly more linear tuning curve. Thereby, a solution to limited relative bandwidths with high VCO gain variation of single VCO synthesizers is offered while substantially reducing the hardware and implementation effort compared to the state-of-the-art.

Electronic measurement systems in the THz frequency range are often bulky and expensive devices. While some compact single-chip systems operating in the high millimeter-wave frequency range have recently been published, compact measurement systems in the low THz frequency range are still rare. The emergence of new silicon-germanium (SiGe) semiconductor technologies allow the integration of system components, like oscillators, frequency multipliers, frequency dividers, and antennas, operating in the low THz frequency range, into a compact monolithic microwave integrated circuits (MMIC), which contains most components to implement a low-cost and compact frequency-modulated continuous-wave-radar transceiver. This article presents a single transceiver solution containing all necessary components. It introduces a $0.48\,\mathrm{THz}$ radar transceiver MMIC with a tuning range of $43\,\mathrm{GHz}$ and an output power of up to $-9.4\,\mathrm{dBm}$ in the SG13G3 $130\,\mathrm{nm}$ SiGe technology by IHP. The MMIC is complemented by a dielectric lens antenna design consisting of polytetrafluoroethylene, providing up to $39.3\,\mathrm d\mathrm B\mathrm i$ of directivity and half-power beam widths of 0.95∘ in transmit and receive direction. The suppression of clutter from unwanted targets deviating from antenna boresight more than 6∘ is higher than $24.6\,\mathrm d \mathrm B$ in E- and H-Plane.

Radio telescopes are among the applications with the highest demands on a local oscillator (LO), which is used to receive and process the signals coming from the sky. Therefore the modules providing the required LO signal have traditionally been big and complicated. To overcome this disadvantage, we implement our own integrated frequency synthesizer inside a small LO module in this article. With this synthesizer we are able to achieve a jitter of only 50 fs integrated from 10 Hz to 2.5 GHz offset at a carrier frequency of 75 GHz. This is in part achieved by a very low in-band phase noise of −111.8 dBc at 10 kHz offset. The stabilizable frequency range is 62–88 GHz. Thus achieving promising results to fulfill this very demanding task with integrated frequency synthesizers in the future.

This study presents an ultra-wideband receiver front-end, designed for a reconfigurable frequency modulated continuous wave radar in a 130 nm SiGe BiCMOS technology. A variety of innovative circuit components and design techniques were employed to achieve the ultra-wide bandwidth, low noise figure (NF), good linearity, and circuit ruggedness to high input power levels. The designed front-end is capable of achieving 1.5–40 GHz bandwidth, 30 dB conversion gain, a double sideband NF of 6–10.7 dB, input return loss better than 7.5 dB and an input referred 1 dB compression point of −23 dBm. The front-end withstands continuous wave power levels of at least 25 and 20 dBm at low band and high band inputs respectively. At 3 V supply voltage, the DC power consumption amounts to 302 mW when the low band is active and 352 mW for the high band case, whereas the total IC size is $3.08\, {\rm nm{^2}}$.

Understanding and resolving discrepancies between atom probe tomography (APT) and secondary ion mass spectrometry (SIMS) measurements of B dopants in Si-based materials has long been a problem for those in the semiconductor community who wish to measure B within the source/drain SiGe of a device. APT data collection of Si-based materials is typically optimized for Si, which is logical, but perhaps not ideal for field evaporation of B. Increasing the evaporation field well beyond the typically used 28Si2+:28Si+ ratio of approximately 10:1 up to a ratio of ~200:1 is demonstrated to improve B detection while retaining well-matched Si and Ge concentrations with respect to those measured by SIMS. A range of evaporation conditions are examined from a very low field with high laser energy to an extremely high field with extremely low laser energy demonstrating problems at both far ends of the spectrum and a sweet spot when the operating conditions used produce a 28Si2+:28Si+ ratio of approximately 200:1 (in terms of total counts of each ionization state), which is more than an order of magnitude higher than normally used conditions and results in nicely matched B, Si, and Ge APT measurements with those of SIMS.

By transmission electron microscopy with extended Burgers vector analyses, we demonstrate the edge and screw character of vertical dislocations (VDs) in novel SiGe heterostructures. The investigated pillar-shaped Ge epilayers on prepatterned Si(001) substrates are an attempt to avoid the high defect densities of lattice mismatched heteroepitaxy. The Ge pillars are almost completely strain-relaxed and essentially defect-free, except for the rather unexpected VDs. We investigated both pillar-shaped and unstructured Ge epilayers grown either by molecular beam epitaxy or by chemical vapor deposition to derive a general picture of the underlying dislocation mechanisms. For the Burgers vector analysis we used a combination of dark field imaging and large-angle convergent beam electron diffraction (LACBED). With LACBED simulations we identify ideally suited zeroth and second order Laue zone Bragg lines for an unambiguous determination of the three-dimensional Burgers vectors. By analyzing dislocation reactions we confirm the origin of the observed types of VDs, which can be efficiently distinguished by LACBED. The screw type VDs are formed by a reaction of perfect 60° dislocations, whereas the edge types are sessile dislocations that can be formed by cross-slips and climbing processes. The understanding of these origins allows us to suggest strategies to avoid VDs.

A 245 GHz sensor system for gas spectroscopy is presented, which includes a SiGe receiver (RX), a SiGe transmitter (TX), and a 0.6 m long gas absorption cell between the TX and RX. The integrated local oscillators of the RX and the TX are controlled by two external phase locked loops (PLLs), whose reference frequencies are swept with constant frequency offset for a low IF of the RX. The RX consists of a differential low noise amplifier (LNA), an integrated 122 GHz local oscillator (LO) with 1/64 divider, a 90° differential hybrid, and active subharmonic mixer. The TX consists of an integrated 122 GHz LO with 1/64 divider, and a frequency doubler. The RX and TX are fabricated in 0.13 µm SiGe BiCMOS with ft/fmax of 300/500 GHz. Using external dielectric lenses for the TX and RX, the absorption spectrum of gaseous methanol has been measured. The reference frequency of the TX-PLL is modulated for frequency-modulation spectroscopy. The performance of the sensor system is demonstrated by measuring the 2f absorption spectrum (second harmonic detection) of gaseous methanol.

A new SiGe heterojunction bipolar phototransistor (HPT) based on a commercially available process was designed, realized, and experimentally characterized. Its internal characteristics, mainly the collector-to-base capacitance, vary significantly with the received light power, making it suitable as an active element of a light-controlled photo-oscillator. It can also be a key component of optical network-on-chip (ONoC). Its responsivity was improved and its transition frequency remains in the range of 30 GHz.

This paper proposes a practical approach for developing a new class of compact slow-wave coplanar waveguide (CPW) series/shunt stubs, which offer 40% reduction in size relative to a conventional design. It demonstrates that the technique using interdigitated capacitive loading can provide size and cost reductions, while also providing performance enhancements such as better return loss. The experimental prototypes presented in this paper demonstrate the validity of the design method and the ability to print interdigitated capacitors inside the center conductor of the series/shunt stubs. The principle of achieving such high-quality circuits is detailed and is also confirmed by theoretical and experimental results, which are in reasonable agreement up to at least 70 GHz. The paper also presents a family of novel topologies of slow wave bandpass filters based on the proposed capacitively loaded CPW series/shunt stubs.

This paper presents measurement results providing the mapping of the opto-microwave transfer function performed on an SiGe microwave heterojunction phototransistor (HPT). This measurements will be used to extract a guideline for designing phototransistors. A mapping of the HPT's gain in low frequency helps to estimate the shape of the optical beam used for the measurement. The study also focuses on the cutoff frequency mapping of the device in phototransistor mode. Finally, these results are used to determine the general optimization rules in the SiGe HPTs design.

This paper presents an investigation of a concurrent low-cost dual-band power amplifier (PA) fabricated in SiGe technology, able to simultaneously operate at two frequencies of 2.45 and 3.5-GHz, including an evaluation of its system level performance potentiality. Taking into account the technology novelty and the lack of device characterization and modeling, a hybrid (MIC) approach has been adopted both for a fast prototyping of the PA and for the evaluation of the device potentiality based on an extensive linear and nonlinear characterization. The comparison of PA performance in single-band or concurrent mode operation will be presented. In particular, the measured PA prototype shows an output power of 17.2 and 17-dBm at a 1-dB compression point, at 2.45 and 3.5-GHz, respectively, for CW single-mode operation, with a power added efficiency around 20%. System-level analysis predicts that, when the PA is operated under the 20-MHz Orthogonal Frequency-Division Multiplexing (OFDM) concurrent signals, the maximum output power levels to maintain the Error Vector Magnitude (EVM) within 5% are 11 and 3.5-dBm at 2.45 and 3.5-GHz, respectively. Moreover, new concepts and possible new system architectures for the development of the next generation of the multi-band transceiver front-end will be provided with an extensive system-level evaluation of the amplifier.

Strained layer heterostructures provide ideal systems with which to study the dynamics of dislocation motion via in situ transmission electron microscopy, as the geometry, strain state, and kinetics can be characterized and directly controlled. We discuss how these structures are used to study dislocation-point defect interactions, emphasizing the experimental requirements necessary for quantification of dislocation motion. Following ion implantation, different concentrations and types of point defects are introduced within the SiGe epilayer depending on the implantation species, energy, and current density. By annealing samples in situ in the transmission electron microscope (TEM) following implantation, we can directly observe dislocation motion and quantify the effect of dislocation-point defect interactions on dislocation velocities. We find that dislocation motion is impeded if the implantation dose peak lies within the epilayer, as dislocations pin at point defect atmospheres. Shallow BF2 implantation into the sample capping layer results in more complicated behavior. For low current density implants, dislocation velocities may be dramatically increased; at higher current densities the magnitude of this increase is significantly smaller. Implantation of different ions separately implicates fluorine as the species responsible for the observed increases in dislocation velocities, presumably due to an electrical effect on the rate of dislocation kink nucleation.