In the present paper we review the most recent degradation modes and mechanisms recently observed in AlGaN/GaN (Aluminum Gallium Nitride/Gallium Nitride). High Electron-Mobility Transistors (HEMTs), as resulting from a detailed accelerated testing campaign, based on reverse bias tests and DC accelerated life tests at various temperatures. Despite the large efforts spent in the last few years, and the progress in mean time to failure values, reliability of GaN HEMTs, and millimeter microwave integrated circuits still represent a relevant issue for the market penetration of these devices. The role of temperature in promoting GaN HEMT failure is controversial, and the accelerating degradation factors are largely unknown. The present paper proposes a methodology for the analysis of failure modes and mechanisms of GaN HEMTs, based on (i) DC and RF stress tests accompanied by an (ii) extensive characterization of traps using deep level transient spectroscopy and pulsed measurements, (iii) detailed analysis of electrical characteristics, and (iv) comparison with two-dimensional device simulations. Results of failure analysis using various microscopy and spectroscopy techniques are presented and failure mechanisms observed at the high electric field values typical of the operation of these devices are reviewed.

Conjugated light-emitting polymers (LEPs) have real potential to serve as the active layer in a new generation of emissive displays. Emerging as lead candidates for first-generation displays are poly(1,4-phenylene vinylene)s (PPVs) and poly(9,9-dialkylfluorene)s, as well as other polyaromatic materials. The poly(fluorene)s are at present the most commercially developed of these LEP materials for red–green–blue (RGB) applications. The low power consumption of LEP devices in general makes them particularly suited to mobile applications. Combining solution-processable emissive polymers with direct-patterning methods such as ink-jet printing will lead to the possibility of low-cost, high-resolution displays. The synthesis and properties of PPVs and poly(9,9-dialkylfluorene)s are briefly reviewed in this article, with a major focus on recent developments.

Mg has been widely used as p-doping species despite its intrinsic difficulties. It is nowadays well established that during the growth process of Mg doped GaN, atomic H is generated from the decomposition of NH3 and Mg-H complexes are formed in the layer. This has been for instance shown by the occurrence of LO mode in IR absorption, and by the observation of the Mg-H local vibration modes. This H passivation limits the electrical activity of Mg, therefore an activation process is required to get full activation of the Mg atoms. In the present study, bismethylcyclopentadienyl magnesium [(MeCp)2Mg] was used as precursor. However, this precursor reacts in the gas phase with NH3 to produce tiny solid particles as evidenced by a very bright diffuse emission visible along the laser beam used for reflectometry measurements. This simplest obvious product would be [(MeCp)Mg(NH2)]m(m≥2). To limit this drawback, Ga and Mg precursor lines have been separated. With proper in situ heat treatment, doping densities up to 1.5×1018 cm−3 have been obtained. PL spectra of lightly Mg doped samples (1016 cm−3) are dominated by shallow donor-acceptor pairs whereas for higher doping densities ( 1018 cm−3), the luminescence is dominated by a broad band in the 2.7-2.9 eV range. GaN LEDs were fabricated from Si doped (n-type) and Mg-doped (p-type) GaN, these LEDs emit in the blue-UV range.

The luminescent properties of AlGaN epitaxial layers with AlN mole fractions up to 30% and various types of AlGaN/GaN-based heterostructures have been studied. The structures were grown on 6H-SiC substrates by MOCVD. The structures' cathodoluminescence and electroluminescence were measured. A “blue” shift of the edge luminescent peak position for AlGaN alloys was measured to be a non-linear function on the AlN mole fraction. For p-AlGaN/n-GaN double heterostructures (DH), the edge peak position was detected at 365 nm (300K). For a p-Al0.05Ga0.95N/n-Al0.03Ga0.97N heterostructure, the electroluminescent edge peak was observed at 355 nm (300K). The effects of temperature and forward current on the edge electroluminescence of theAlGaN/GaN DH's were investigated.