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In situ Characterization of Exposed E-Beam Resist Using Novel AFM Technique

Published online by Cambridge University Press:  01 August 2010

M Zech ,
H Koop ,
K Karrai ,
D Schnurbusch ,
A Holleitner  and
M Mueller
M Zech
Affiliation:
attocube systems, Germany
H Koop
Affiliation:
attocube systems, Germany
K Karrai
Affiliation:
attocube systems, Germany
D Schnurbusch
Affiliation:
Technische Universität Munich, Germany
A Holleitner
Affiliation:
Technische Universität Munich, Germany
M Mueller
Affiliation:
Technische Universität Munich, Germany

Extract

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Extended abstract of a paper presented at Microscopy and Microanalysis 2010 in Portland, Oregon, USA, August 1 – August 5, 2010.

Type
Abstract
Information
Microscopy and Microanalysis , Volume 16 , Supplement S2 , July 2010 , pp. 476 - 477
Copyright
Copyright © Microscopy Society of America 2010