Hostname: page-component-cd9895bd7-jkksz Total loading time: 0 Render date: 2024-12-28T17:12:13.403Z Has data issue: false hasContentIssue false
  • English
  • Français

Two-Dimensional Dopant Profiling in Silicon by SEM in Combination with Electrostatic Calculations

Published online by Cambridge University Press:  01 August 2010

B Wolpensinger ,
MA Kessler  and
PP Altermatt
B Wolpensinger
Affiliation:
Institut für Solarenergieforschung Hameln, Germany
MA Kessler
Affiliation:
Institut für Solarenergieforschung Hameln, Germany
PP Altermatt
Affiliation:
Leibniz University of Hannover, Germany

Extract

Core share and HTML view are not available for this content. However, as you have access to this content, a full PDF is available via the ‘Save PDF’ action button.

Extended abstract of a paper presented at Microscopy and Microanalysis 2010 in Portland, Oregon, USA, August 1 – August 5, 2010.

Type
Abstract
Information
Microscopy and Microanalysis , Volume 16 , Supplement S2 , July 2010 , pp. 1926 - 1927
Copyright
Copyright © Microscopy Society of America 2010