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Asymmetries in the Formation of Electromigration Damage Around Divergence Dipoles in a Metallization Track

Published online by Cambridge University Press:  21 February 2011

A. P. Schwarzenberger  and
A. L. Greer
A. P. Schwarzenberger
Affiliation:
University of Cambridge, Department of Materials Science and Metallurgy, Pembroke Street, Cambridge, CB2 3QZ, U.K.
A. L. Greer
Affiliation:
University of Cambridge, Department of Materials Science and Metallurgy, Pembroke Street, Cambridge, CB2 3QZ, U.K.
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Abstract

Electromigration damage mechanisms around lithographically introduced notches in unannealed and annealed test tracks are studied.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 108 , 1987 , 327
Copyright
Copyright © Materials Research Society 1988

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References

REFERENCES

1d'Heurle, F.M., and Ho, P.S., in Thin films - interdiffusion and reactions, (edited by Poate, J.M., Tu, K.N. and Mayer, J.W.), Wiley, New York, 1978Google Scholar
2Ross, C.A. and Evetts, J.E., Scripta Metall. 21 1077 (1987)Google Scholar
3Ross, C.A. and Evetts, J.E., presented at the 1987 MRS Fall meeting, Boston, MA, 1987 (Published in these proceedings, paper 17.5)Google Scholar
4Thomas, R.W. and Calabrese, D.W., 21st Annual Proceedings on Reliability Physics, pp1–9 (1983)Google Scholar
5Iyer, S.S. and Wong, C.Y., J. Appl. Phys., 57 4594 (1987)Google Scholar