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Analysis Of Boron And Other Light Elements in Glasses by the Fundamental Parameter Method

Published online by Cambridge University Press:  06 March 2019

Franz Weber
Affiliation:
Institute of Applied and Technical Physics University of Technology A-1040 Vienna, Austria
Michael Mantler
Affiliation:
Institute of Applied and Technical Physics University of Technology A-1040 Vienna, Austria
Martin Kaufmann
Affiliation:
Institute of Applied and Technical Physics University of Technology A-1040 Vienna, Austria
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Summary

In the current work an attempt was made to apply the fundamental parameter method to the analysis of boron, oxygen, fluorine and heavier components of silica glasses. Experimental results are presented and compared with calculations based on theoretical work. The specimens consist of sets of certified standards which were obtained from Breitlahder company, Germany.

Furthermore, it is shown that the match between the certified compositions and fundamental parameter computations is affected by the quality of available fundamental parameters for the ultralight elements as well as by the underlying mathematical models. Especially in quantitative analysis of these elements, a large variety of secondary enhancement effects must be taken into account. Two major mechanisms have been considered in the presented computations: excitation by fluorescence photons emitted from aiJ available excited atoms, and excitation by photoelectrons ejected after the primary ionization event. Their magnitude exceeds that of the conventional energy region by far and thus uncertainities in the corrective algorithms have a large effect,

Type
Research Article
Copyright
Copyright © International Centre for Diffraction Data 1993

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References

1. Arai, T. and Sohmura, T.; Adv. in X-ray Anal 26, 423 (1983).Google Scholar
2. Schuster, M., Müller, M., Mauser, K. E. and Straub, R.: Thin Solid Films 157, 325336 (1988).Google Scholar
3. Shiraiwa, T. and Fujino, N.: Jpn. J. Appl. Phys. 5, 886 (1966).Google Scholar
4. Mantler, M.: Adv. in X-ray Anal. 36 (1), 2733 (1992).Google Scholar
5. Green, M. and Cosslett, V. E.: Proc. Phys. Soc. 78, 1206 (1961).Google Scholar
6. Worthington, C. R. and Tomlim, S. G. Proc. Phys. Soc. A 69, 401 (1956).Google Scholar
7. Whiddington, R.: Proc. Roy. Soc. A 86, 360 (1912).Google Scholar
8. Manlier, M. and Weber, F.: submitted to XRSGoogle Scholar
9. Saloman, E. B. and Hubbel, J. H.: NBSIR 86-3431, US-Dpt. of Commerce, Gaithersburg, MD.Google Scholar
10. Fischer, D. W. and Baun, W. L.: J. Appl. Phys. 39 (10), 4757 (1968).Google Scholar
11. Fischer, D. W.: J. Appl. Phys. 40 (10), 4151 (1969).Google Scholar
12. Fischer, D. W.: J. Appl. Phys. 41 (9), 3561 (1970).Google Scholar
13. Grasserbauer, M.: Habilitationsschrift. Technisehe Universität Wien (1973).Google Scholar