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TXRF High Sensitivity X-Ray Analyzer With Multi-Layer Monochromator

Published online by Cambridge University Press:  06 March 2019

T. Utaka ,
T. Shoji ,
K. Shimizu ,
T. Arai  and
R. Wilson
T. Utaka
Affiliation:
Rigaku Industrial Corporation Osaka, Japan
T. Shoji
Affiliation:
Rigaku Industrial Corporation Osaka, Japan
K. Shimizu
Affiliation:
Rigaku Industrial Corporation Osaka, Japan
T. Arai
Affiliation:
Rigaku Industrial Corporation Osaka, Japan
R. Wilson
Affiliation:
Rigaku/USA, Incorporated Danvers, MA USA
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Extract

Total reflection X-ray Fluorescence (TXRF) has been applied to the detection and quantification of metal contamination on the surface and near-surface regions of silicon wafers in the semiconductor industry The need for improving the sensitivity and detection limit of the TXRF technique is driven by the progress in producing thinner films and finer features in the development of larger Mbit DRAMS.

Type
Research Article
Information
Advances in X-Ray Analysis , Volume 37: Forty-Second Annual Conference on Applications of X-ray Analysis, August 2-6, 1993 , 1993 , pp. 599 - 605
Copyright
Copyright © International Centre for Diffraction Data 1993

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