Hostname: page-component-cd9895bd7-jn8rn Total loading time: 0 Render date: 2024-12-27T15:09:04.735Z Has data issue: false hasContentIssue false
  • English
  • Français

The Use of a Conventional Powder Diffractometer for Thin-Film Thickness Determination From Reflectivity DATA

Published online by Cambridge University Press:  06 March 2019

T. C. Huang ,
R. Gilles  and
G. Will
T. C. Huang
Affiliation:
Mineralogical Institute, University Bonn Poppelsdorfer Schloss, 5300 Bonn 1, Germany
R. Gilles
Affiliation:
Mineralogical Institute, University Bonn Poppelsdorfer Schloss, 5300 Bonn 1, Germany
G. Will
Affiliation:
Mineralogical Institute, University Bonn Poppelsdorfer Schloss, 5300 Bonn 1, Germany
Get access

Abstract

Precise thin-film thicknesses have been obtained from X-ray specular and off-specular reflectivity data collected with a conventional powder diffractometer. An analysis of the specular reflectivity curve for a 565.9-Å thick pt film showed the results agreed with those determined previously from high-resolution reflectometer data to within 6.6 Å or 1.2%. An analysis of the off-specular reflectivity curves which have well-defined interference fringes showed that the results were insensitive to the surface alignment. Values of Pt thickness for the off-specular reflectivity curves agreed with that of the specular reflectivity curve to within 6.2 Å or 1.1%. The insensitivity in film-surface misalignment makes conventional powder diffractometer attractive for film-thickness determination and opens this techniques to many laboratories.

Type
Research Article
Information
Advances in X-Ray Analysis , Volume 37: Forty-Second Annual Conference on Applications of X-ray Analysis, August 2-6, 1993 , 1993 , pp. 183 - 188
Copyright
Copyright © International Centre for Diffraction Data 1993

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Kiessig, H., Ann. Phys. (Leipzig) 10, 769, (1931).Google Scholar
2. Parratt, L. G., Phys. Rev. 95, 359, (1954).Google Scholar
3. Russell, T. P., Mater. Sci. Rept - 5, 171, (1990).Google Scholar
4. Meyerheim, H. L. and Göbel, H. E., Thin Solid Films 199, 343, (1991).Google Scholar
5. Huang, T. C., Nozieres, J. P., Speriosu, V. S., Lefakis, H. and Gurney, B. A., Appl. Phys. Lett. 60, 1573, (1992).Google Scholar
6. Segmüller, A., Thin Solid Films 18, 287, (1973).Google Scholar
7. Lengeler, B., Adv. X-Ray Anal. 35, 127, (1992).Google Scholar
8. Huang, T. C., Toraya, H., Blanton, T. and Wu, Y., J. Appl. Cryst. 26, 180, (1993).Google Scholar
9. Azaroff, L. V., Elements in X-Ray Crystallography, McGraw-Hill, New York, 1968, Chapter 6.Google Scholar
10. Huang, T. C. and Parrish, W., Adv. X-ray Anal. 35, 137, (1992).Google Scholar
11. Huang, T. C., Gilles, R. and Will, G., Thin Solid Films 231 (in press).Google Scholar
12. Parrish, W., Erickson, C., Huang, T. C., Hart, M., Gilles, B. and Toraya, H., Mat. Res. Symp. Proc. 208, 327, (1991).Google Scholar