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Determination of Thickness of Multiple Layer Thin Films by X-ray Diffraction Technique

Published online by Cambridge University Press:  06 March 2019

J. Chaudhuri  and
F. Hashmi
J. Chaudhuri
Affiliation:
Mechanical Engineering Department, Wichita State University, Wichita, KS 67260
F. Hashmi
Affiliation:
Mechanical Engineering Department, Wichita State University, Wichita, KS 67260
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Abstract

In this study, the equations based on x-ray diffraction theory were developed to determine the thickness of multiple layer thin films. The kinematical expression of the integrated reflected intensity from the substrate and films was corrected for the primary and secondary extinction effects assuming a mosaic crystal model. As an example of the application of the method, thicknesses of a double heterostructure system, namely AlAs/AIGaAs/GaAs, were determined. Good agreement was obtained between the results from the x-ray measurement and scanning electron microscopy data demonstrating high precision of this technique.

Type
Research Article
Information
Advances in X-Ray Analysis , Volume 39: Forty-Fourth Annual Conference on Applications of X-ray Analysis, July 31 - August 4, 1995 , 1995 , pp. 637 - 643
Copyright
Copyright © International Centre for Diffraction Data 1995

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References

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