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Instrumentations and Applications for the Soft and Ultrasoft X-Ray Measurements

Published online by Cambridge University Press:  06 March 2019

Hisayuki Kohno  and
Tomoya Arai
Hisayuki Kohno
Affiliation:
Rigaku Industrial Corporation Akaoji, Takatsuki, Osaka, Japan
Tomoya Arai
Affiliation:
Rigaku Industrial Corporation Akaoji, Takatsuki, Osaka, Japan
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Extract

The development of X-ray fluorescence analysis of light elements (e.g. O, C, B and Be) has been carried out for many applications. Recently, the revolutional expansion of semiconductor electronic and memory devices has roused the needs of analysis and identification of the surface and the single- and multi-layered film structure in devices, using the fundamental parameter method for the soft and ultrasoft X-ray region. From the view point of the extensive studies of soft and ultrasoft X-ray measurements.

Type
II. Analysis of Light Elements by X-Ray Spectrometry
Information
Advances in X-Ray Analysis , Volume 36: Forty-First Annual Conference on Applications of X-ray Analysis, August 3-7, 1992 , 1992 , pp. 59 - 64
Copyright
Copyright © International Centre for Diffraction Data 1992

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References

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