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Small Area X-Ray Fluorescence Analysis of Multilayer Thin Metal Films

Published online by Cambridge University Press:  06 March 2019

M.A. Zaitz
M.A. Zaitz*
Affiliation:
IBM Analytical Services Group Route 52, Hopewell Junction New York 12533
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Abstract

Thin film technology has become an integral part of semiconductor multichip ceramic packages. Characterizing the thickness of multimetal multilayer thin film structures that combine both thin and thick films is an important parameter for manufacturing process control and development. Accuracies in the range of 3-5% and precisions of 1.3% were attained on multilayer metal films ranging from a few hundred angstroms to tens of thousands of angstroms.

Type
Research Article
Information
Advances in X-Ray Analysis , Volume 37: Forty-Second Annual Conference on Applications of X-ray Analysis, August 2-6, 1993 , 1993 , pp. 219 - 227
Copyright
Copyright © International Centre for Diffraction Data 1993

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References

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