Toward highly scaled AlN/GaN-on-Silicon devices for millimeter wave applications
Published online by Cambridge University Press: 02 May 2013
Abstract
In this work, the possibility of achieving GaN-on-Si devices for millimeter wave applications operating at high bias is demonstrated. It is shown that highly scaled AlN/GaN-on-Si double heterostructure enables us to significantly improve electron confinement under high electric field as compared to single heterostructure while delivering high carrier density (>2 × 1013 cm−2). Subsequently, trapping effects can be minimized resulting in the highest GaN-on-Si output power density up to 40 GHz and at a drain bias of 15 V together with a record fmax close to 200 GHz. At higher bias, infrared camera analysis clearly shows that these devices are mainly limited by self-heating effects. Furthermore, low noise figure has been assessed on this heterostructure, promising integration of cost effective low noise and high power millimeter wave amplifiers.
- Type
- Research Papers
- Information
- International Journal of Microwave and Wireless Technologies , Volume 5 , Special Issue 3: European Microwave Week 2012 , June 2013 , pp. 335 - 340
- Copyright
- Copyright © Cambridge University Press and the European Microwave Association 2013
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