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An examination of organometallic thermal stability and its relevance to low-temperature MOCVD growth of HgCdTe

Published online by Cambridge University Press:  31 January 2011

W. E. Hoke ,
P. J. Lemonias  and
R. Korenstein
W. E. Hoke
Affiliation:
Raytheon Research Division, 131 Spring Street, Lexington, Massachusetts 02173
P. J. Lemonias
Affiliation:
Raytheon Research Division, 131 Spring Street, Lexington, Massachusetts 02173
R. Korenstein
Affiliation:
Raytheon Research Division, 131 Spring Street, Lexington, Massachusetts 02173
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Abstract

A well-established stability model for hydrocarbon molecules is reviewed and then applied to organometallic compounds used in the epitaxial growth of HgCdTe films. For hydrocarbon molecules, the strength of carbon-hydrogen bonds is modified by neighboring organic groups. The mechanism for this effect is delocalization of the free radical electronic charge by the neighboring groups. The delocalization effect is present in organometallic compounds and is illustrated for tellurium, mercury, and cadmium compounds. An important application of the delocalization effect is the development of a low-temperature approach for pyrolytic metalorganic growth of HgCdTe.

Type
Articles
Information
Journal of Materials Research , Volume 3 , Issue 2 , April 1988 , pp. 329 - 334
Copyright
Copyright © Materials Research Society 1988

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