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Microstructural control of amorphous silicon films crystallized using an excimer laser

Published online by Cambridge University Press:  31 January 2011

John Viatella  and
Rajiv K. Singh
John Viatella
Affiliation:
Department of Materials Science and Engineering, University of Florida, Gainesville, Florida 32611
Rajiv K. Singh
Affiliation:
Department of Materials Science and Engineering, University of Florida, Gainesville, Florida 32611
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Abstract

A technique for microstructural control of excimer laser-annealed silicon thin films on SiO2 substrates has been developed. By using single-crystal photolithographically etched silicon seed wafers in intimate contact with the silicon films, we have shown that it is possible to spatially control nucleation. Transmission electron micrographs show the resultant microstructure to consist of large (∼1 µm) grain structures in the area surrounding the seed contact, with distinct organization not previously observed. A theoretical discussion is presented to explain the observed phenomena. Also, results from a numerical simulation are given which outline the effects of the seed wafer on the resultant microstructure of the laser-annealed film, as compared to nonseeded areas.

Type
Articles
Information
Journal of Materials Research , Volume 13 , Issue 8 , August 1998 , pp. 2105 - 2109
Copyright
Copyright © Materials Research Society 1998

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References

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