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Thermal shock-induced fracture of ion-implanted LiF crystals

Published online by Cambridge University Press:  31 January 2011

V. N. Gurarie  and
J. S. Williams
V. N. Gurarie
Affiliation:
School of Science and Mathematics Education, University of Melbourne, Institute of Education, Parkville, VIC, 3052, Australia
J. S. Williams
Affiliation:
Microelectronics and Materials Technology Centre, RMIT, Melbourne 3001, and Department of Electronic Materials, Engineering Research School of Physical Sciences, ANU, Canberra 2600, Australia
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Abstract

Monocrystals of LiF, ion implanted with Ar+, were exposed to thermal shock in a plasma of different intensities. Ion implantation substantially alters the fracture pattern and characteristics of the material, particularly in reducing the thermal shock resistance parameter, S′, and in increasing the damage resistance parameter, S″. The former parameter indicates that ion implantation allows fracture to be initiated at lower thermal shock temperature differences and the latter parameter is associated with higher crack densities and lower crack penetration depths. The increase in the parameter S″ indicates that ion implantation can result in a higher mechanical stability and greater durability of the crystals damaged by thermal shock. Surface melting at very high heat fluxes eliminates any effect of ion implantation.

Type
Articles
Information
Journal of Materials Research , Volume 5 , Issue 6 , June 1990 , pp. 1257 - 1265
Copyright
Copyright © Materials Research Society 1990

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