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Addendum: “Partial agglomeration during Co silicide film formation” [J. Mater. Res. 7, 269 (1992)]

Published online by Cambridge University Press:  31 January 2011

Z.G. Xiao ,
G.A. Rozgonyi ,
C.A. Canovai  and
C.M. Osburn
Z.G. Xiao
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Raleigh, North Carolina 27695-7916
G.A. Rozgonyi
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Raleigh, North Carolina 27695-7916
C.A. Canovai
Affiliation:
Department of Electrical and Computer Engineering, North Carolina State University, Raleigh, North Carolina 27695-7911
C.M. Osburn
Affiliation:
Department of Electrical and Computer Engineering, North Carolina State University, Raleigh, North Carolina 27695-7911
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Type
Addendum
Information
Journal of Materials Research , Volume 7 , Issue 11 , November 1992 , pp. 3159
Copyright
Copyright © Materials Research Society 1992

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References

1Beyers, Robert, Ph.D. Thesis, Stanford University (1989),Google Scholar
2Srolovitz, D. J. and Safran, S. A., J. Appl. Phys. 60, 247 (1986), andGoogle Scholar
3Xiao, Z. G., Rozgonyi, G. A., Jiang, H., Honey-cutt, J., Osburn, C. M., and McGuire, G., in Extended Abstracts, Vol. 90–1 (1990) of the Electrochem. Soc, Pennington, NJ, p. 258.”Google Scholar