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Carbon nitride films produced by high-energy shock plasma deposition

Published online by Cambridge University Press:  03 March 2011

L.A. Bursill ,
Peng JuLin ,
V.N. Gurarie ,
A.V. Orlov  and
S. Prawer
L.A. Bursill
Affiliation:
School of Physics, The University of Melbourne, Parkville, 3052 Victoria, Australia
Peng JuLin
Affiliation:
School of Physics, The University of Melbourne, Parkville, 3052 Victoria, Australia
V.N. Gurarie
Affiliation:
School of Physics, The University of Melbourne, Parkville, 3052 Victoria, Australia
A.V. Orlov
Affiliation:
School of Physics, The University of Melbourne, Parkville, 3052 Victoria, Australia
S. Prawer
Affiliation:
School of Physics, The University of Melbourne, Parkville, 3052 Victoria, Australia
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Abstract

High-energy shock plasma deposition techniques are used to produce carbon-nitride films containing both crystalline and amorphous components. The structures are examined by high-resolution transmission electron microscopy, parallel-electron-energy loss spectroscopy, and electron diffraction. The crystalline phase appears to be face-centered cubic with a unit cell parameter approx. a = 0.63 nm, and it may be stabilized by calcium and oxygen at about 1–2 at. % levels. 85 at. % of the carbon atoms appear to have trigonal bonding for the crystalline phase, the remaining 15 at.% having tetrahedral bonding. The amorphous carbon-nitride film component varies from essentially nanocrystalline graphite, containing virtually no nitrogen, to amorphous carbon-nitride containing up to 10 at. % N, where the fraction of sp3 bonds ranges up to approx. 85 at. %. There is PEELS evidence that the nitrogen atoms have sp2 trigonal bonds in both the amorphous and crystalline phases.

Type
Articles
Information
Journal of Materials Research , Volume 10 , Issue 9 , September 1995 , pp. 2277 - 2285
Copyright
Copyright © Materials Research Society 1995

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