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Characterization of biofunctional thin films deposited by activated vapor silanization

Published online by Cambridge University Press:  31 January 2011

María Arroyo-Hernández ,
José Pérez-Rigueiro ,
Ana Conde ,
Aurelio Climent ,
Raul Gago ,
Miguel Manso  and
José M. Martínez-Duart
María Arroyo-Hernández*
Affiliation:
Faculty of Sciences, Department of Applied Physics C-12, Universidad Autónoma de Madrid, 28049 Cantoblanco, Madrid, Spain
José Pérez-Rigueiro
Affiliation:
Department of Materials Science, Escuela Técnica Superior de Ingenieros (ETSI) Caminos, Canales y Puertos, Universidad Politécnica de Madrid, 28040 Madrid, Spain
Ana Conde
Affiliation:
Department of Corrosion and Protection, Centro Nacional de Investigaciones Metalúrgicas (CENIM-CSIC), 28040 Madrid, Spain
Aurelio Climent
Affiliation:
Centro de Micro-Análisis de Materiales, Universidad Autónoma de Madrid, 28049 Madrid, Spain
Raul Gago
Affiliation:
Centro de Micro-Análisis de Materiales, Universidad Autónoma de Madrid, 28049 Madrid, Spain
Miguel Manso
Affiliation:
Faculty of Sciences, Department of Applied Physics C-12, Universidad Autónoma de Madrid, 28049 Cantoblanco, Madrid, Spain
José M. Martínez-Duart
Affiliation:
Faculty of Sciences, Department of Applied Physics C-12, Universidad Autónoma de Madrid, 28049 Cantoblanco, Madrid, Spain
*
a)Address all correspondence to this author. e-mail: marroyo@imm.cnm.csic.es
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Abstract

A novel technique based in the combination of vapor silanization and chemical vapor deposition, hereafter referred to as activated vapor silanization (AVS), is shown to be an effective biofunctionalization technique. The AVS process results in thin organic films with a high surface amine concentration when deposited on substrates with different chemical characteristics, such as silicon, porous silicon, or gold. Chemical characterization shows that the films are composed of carbon (hydrocarbon, C–Si, C–C), silicon (different oxidation states), nitrogen (primary and secondary amines), oxygen, and hydrogen. Relevantly, the amines are also distributed along the film thickness, ensuring functionality even after some degradation of the films. AVS films behave practically as monocrystalline silicon substrates under loading–unloading tests. In addition, the AVS films behave as permeable membranes for molecules smaller than 5 Å, and the amine surface concentration is estimated to be 8 NH2/nm2 for molecules of about 12 Å, which is three times higher than that obtained with standard silanization procedures.

Keywords

Chemical vapor deposition (CVD) (deposition)Metalorganic depositionSurface reaction
Type
Articles
Information
Journal of Materials Research , Volume 23 , Issue 7 , July 2008 , pp. 1931 - 1939
Copyright
Copyright © Materials Research Society 2008

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References

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