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Chemical vapor deposition of an aluminum nitride–diamond composite in a triple torch plasma reactor

Published online by Cambridge University Press:  31 January 2011

Marcus Asmann ,
Robert F. Cook ,
Joachim V. Heberlein  and
Emil Pfender
Marcus Asmann
Affiliation:
High Temperature and Plasma Laboratory, University of Minnesota, Minneapolis, Minnesota 55455
Robert F. Cook
Affiliation:
Chemical Engineering and Materials Science Dept., University of Minnesota, Minneapolis, Minnesota 55455
Joachim V. Heberlein
Affiliation:
High Temperature and Plasma Laboratory, University of Minnesota, Minneapolis, Minnesota 55455
Emil Pfender
Affiliation:
High Temperature and Plasma Laboratory, University of Minnesota, Minneapolis, Minnesota 55455
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Abstract

An aluminum nitride–diamond composite has been produced by sequential deposition of AlN and diamond in a triple torch plasma reactor (TTPR). AlN was deposited from AlN powder by injection into the argon–nitrogen, converging plasma plume of a TTPR. Velocity and temperature profiles of the converging plasma plume, obtained by enthalpy probe measurements, were used to show that the powder decomposed prior to reaching the substrate. Diamond was deposited in an argon–hydrogen–methane system onto the existing AlN film. Characterization of an AlN–diamond–AlN composite indicated a Vickers hardness of 18.6 GPa and a modulus of elasticity of 245–282 GPa.

Type
Articles
Information
Journal of Materials Research , Volume 16 , Issue 2 , February 2001 , pp. 469 - 477
Copyright
Copyright © Materials Research Society 2001

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