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Comparison of hydrophilic properties of amorphous TiOx films obtained by radio frequency sputtering and plasma-enhanced chemical vapor deposition

Published online by Cambridge University Press:  31 January 2011

Masatoshi Nakamura ,
Toru Aoki ,
Yoshinori Hatanaka ,
Dariusz Korzec  and
Jurgen Engemann
Masatoshi Nakamura*
Affiliation:
Graduate School of Electronic Science and Technology, Shizuoka University, 3-5-1 Johoku, Hamamatsu, 432-8011, Japan
Toru Aoki
Affiliation:
Graduate School of Electronic Science and Technology, Shizuoka University, 3-5-1 Johoku, Hamamatsu, 432-8011, Japan
Yoshinori Hatanaka
Affiliation:
Graduate School of Electronic Science and Technology, Shizuoka University, 3-5-1 Johoku, Hamamatsu, 432-8011, Japan
Dariusz Korzec
Affiliation:
Microstructure Center, University of Wuppertal, Obere Lichtenplatzer Strasse 336
Jurgen Engemann
Affiliation:
Microstructure Center, University of Wuppertal, Obere Lichtenplatzer Strasse 336
*
a)Address all correspondence to this author. e-mail: nakamura@vc.gsest.shizuoka.ac.jp
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Abstract

The hydrophilic properties of amorphous TiOx films prepared by different methods, e.g., radio frequency (rf) sputtering and plasma-enhanced chemical vapor deposition (PECVD), were studied. It was found that the hydrophilicity strongly depends on the film structure. The best hydrophilicity was realized with the PECVD amorphous film having distorted Ti–O bonds due to a large amount of OH groups. These characteristics of the PECVD amorphous film suggest that such a low-density film including distorted Ti–O bonds could increase the photoenhancement efficiency by ultraviolet radiation. This reason is also supported from the results that a low-density rf sputtered film presented a higher hydrophilicity compared to a high-density radio frequency sputtered film. Furthermore, both electrical and chemical effects of OH groups will also contribute to the good hydrophilicity of the PECVD film.

Type
Articles
Information
Journal of Materials Research , Volume 16 , Issue 2 , February 2001 , pp. 621 - 626
Copyright
Copyright © Materials Research Society 2001

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References

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