Hostname: page-component-78c5997874-m6dg7 Total loading time: 0 Render date: 2024-11-10T22:32:39.520Z Has data issue: false hasContentIssue false
  • English
  • Français

Controlling the microstructure of vapor-deposited pentaerythritol tetranitrate films

Published online by Cambridge University Press:  29 June 2011

Robert Knepper ,
Alexander S. Tappan ,
Ryan R. Wixom  and
Mark A. Rodriguez
Robert Knepper*
Affiliation:
Sandia National Laboratories, Albuquerque, New Mexico 87185
Alexander S. Tappan
Affiliation:
Sandia National Laboratories, Albuquerque, New Mexico 87185
Ryan R. Wixom
Affiliation:
Sandia National Laboratories, Albuquerque, New Mexico 87185
Mark A. Rodriguez
Affiliation:
Sandia National Laboratories, Albuquerque, New Mexico 87185
*
a)Address all correspondence to this author. e-mail: rkneppe@sandia.gov
Get access

Abstract

We have demonstrated that the microstructure of thick pentaerythritol tetranitrate (PETN) films can be controlled using physical vapor deposition by varying the film/substrate interface. PETN films were deposited on silicon and fused silica with and without a thin layer of sputtered aluminum to demonstrate the effects of the interface on subsequent film growth. Evolution of surface morphology, average density, and surface roughness as a function of film thickness were characterized using surface profilometry, scanning electron microscopy, and atomic force microscopy. Significant variations in density, pore size, and surface morphology were observed in films deposited on the different substrates. In addition, x-ray diffraction experiments showed that while films deposited on bare fused silica or silicon had only weak texturing, films deposited on a sputtered aluminum layer were highly oriented, with a strong (110) out-of-plane texture.

Keywords

MicrostructureEnergetic materialPhysical vapor deposition
Type
Articles
Information
Journal of Materials Research , Volume 26 , Issue 13 , 14 July 2011 , pp. 1605 - 1613
Copyright
Copyright © Materials Research Society 2011

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1.Movchan, B.A. and Demchishin, A.V.: Study of structure and properties of thick film vacuum condensates of nickel, titanium, tungsten, aluminum oxide, and zirconium dioxide. Phys. Met. Metall. 28, 83 (1969).Google Scholar
2.Thornton, J.A.: High-rate thick-film growth. Annu. Rev. Mater. Sci. 7, 239 (1977).CrossRefGoogle Scholar
3.Messier, R., Giri, A.P., and Roy, R.A.: Revised strucuture zone model for thin-film physical structure. J. Vac. Sci. Technol., A 2, 500 (1984).CrossRefGoogle Scholar
4.Kafer, D. and Witte, G.: Growth of crystalline rubrene films with enhanced stability. Phys. Chem. Chem. Phys. 7, 2850 (2005).CrossRefGoogle ScholarPubMed
5.Witte, G., Hanel, K., Sohnchen, S., and Woll, C.: Growth and morphology of thin films of aromatic molecules on metals: The case of perylene. Appl. Phys., A 82, 447 (2006).CrossRefGoogle Scholar
6.Schreiber, F.: Organic molecular beam deposition: Growth studies beyond the first monolayer. Phys. Status Solidi. A 201, 1037 (2004).CrossRefGoogle Scholar
7.Mobus, M. and Karl, N.: The growth of organic thin-films on silicon substrates studied by x-ray reflectometry. Thin Solid Films 215, 213 (1992).CrossRefGoogle Scholar
8.Forrest, S.R., Burrows, P.E., Haskal, E.I., and So, F.F.: Ultrahigh-vacuum quasiepitaxial growth of model van-der-Waals thin-films Part 2-Experiment. Phys. Rev. B 49, 11309 (1994).CrossRefGoogle Scholar
9.Fenter, P., Schreiber, F., Zhou, L., Eisenberger, P., and Forrest, S.R.: In situ studies of morphology, strain, and growth modes of a molecular organic thin film. Phys. Rev. B 56, 3046 (1997).CrossRefGoogle Scholar
10.Yang, F., Shtein, M., and Forrest, S.R.: Morphology control and material mixing by high-temperature organic vapor-phase deposition and its application to thin-film solar cells. J. Appl. Phys. 98, 014906 (2005).CrossRefGoogle Scholar
11.Zhong, D.Y., Hirtz, M., Wang, W.C., Dou, R.F., Chi, L.F., and Fuchs, H.: Kinetics of island formation in organic film growth. Phys. Rev. B 77, 113404 (2008).CrossRefGoogle Scholar
12.Vasseur, K., Rolin, C., Vandezande, S., Temst, K., Froyen, L., and Heremans, P.: A growth and morphology study of organic vapor phase deposited perylene diimide thin films for transistor applications. J. Phys. Chem. C 114, 2730 (2010).CrossRefGoogle Scholar
13.Zhang, G.X. and Weeks, B.L.: Surface morphology of organic thin films at various vapor flux. Appl. Surf. Sci. 256, 2363 (2010).CrossRefGoogle Scholar
14.Eyring, H., Powell, R.E., Duffy, G.H., and Parlin, R.B.: The stability of detonation. Chem. Rev. 45, 69 (1949).CrossRefGoogle Scholar
15.Campbell, A.W., Davis, W.C., Ramsay, J.B., and Travis, J.R.: Shock initiation of solid explosives. Phys. Fluids 4, 511 (1961).CrossRefGoogle Scholar
16.Howe, P., Frey, R., Taylor, B., and Boyle, V.: Shock initiation and the critical energy concept, in Proceedings of the 6th Symposium (International) on Detonation (Office of Naval Research, Arlington, VA, 1976), p. 11.Google Scholar
17.Dobratz, B.M. and Crawford, P.C.: LLNL explosives handbook – properties of chemical explosives and explosive simulants (Lawrence Livermore National Laboratory Report UCRL-52997-Chg.2, Livermore, CA, 1985).Google Scholar
18.Khasainov, B.A., Ermolaev, B.S., Presles, H.N., and Vidal, P.: On the effect of grain size on shock sensitivity of heterogeneous high explosives. Shock Waves 7, 89 (1997).CrossRefGoogle Scholar
19.Bourne, N.K.: On the laser ignition and initiation of explosives. Proc. R. Soc. London, Ser. A 457, 1401 (2001).CrossRefGoogle Scholar
20.Kotomin, A.A., Kozlov, A.S., and Dushenok, S.A.: Detonatability of high-energy-density heterocyclic compounds. Russ. J. Phys. Chem. B 1, 573 (2007).CrossRefGoogle Scholar
21.Sheffield, S.A. and Engelke, R.P.: Condensed-phase explosives: Shock initiation and detonation phenomena, in Shock Wave Science and Technology Reference Library, edited by Horie, Y. (Springer-Verlag, Berlin Heidelberg, 2009), pp. 1–59.Google Scholar
22.Campbell, A.W. and Engelke, R.: The diameter effect in high-density heterogeneous explosives, in Proceedings of the 6th Symposium (International) on Detonation (Office of Naval Research, Arlington, VA, 1976), p. 642.Google Scholar
23.Wang, X.L., Jiao, Q.J., and Li, G.X.: Study on integrated charge technology of microminiature explosion element, in Theory and Practice of Energetic Materials, Vol. 6, edited by Wang, Y.J., Huang, P.G., and Li, S.G.. (Science Press, Monmouth Junction, 2005) pp. 61–65.Google Scholar
24.Tappan, A.S., Knepper, R., Wixom, R.R., Miller, J.C., Marquez, M.P., and Ball, J.P.: Critical thickness measurements in vapor-deposited pentaerythritol tetranitrate (PETN) films, in Proceedings of the 14th International Detonation Symposium (Office of Naval Research, Arlington, VA, 2010), p. 1087.Google Scholar
25.Bolme, C.A., McGrane, S.D., Moore, D.S., and Funk, D.J.: Single shot measurements of laser driven shock waves using ultrafast dynamic ellipsometry. J. Appl. Phys. 102, 033513 (2007).CrossRefGoogle Scholar
26.Armstrong, M.R., Crowhurst, J.C., Bastea, S., and Zaug, J.M.: Observation of off-hugoniot shocked states with ultrafast time resolution, in Proceedings of the 14th International Detonation Symposium (Office of Naval Research, Arlington, VA, 2010), p. 435.Google Scholar
27.Do, T., Splinter, S.J., Chen, C., and McIntyre, N.S.: The oxidation kinetics of Mg and Al surfaces studied by AES and XPS. Surf. Sci. 387, 192 (1997).CrossRefGoogle Scholar
28.Wixom, R.R., Tappan, A.S., Long, G.T., Renlund, A.M., Welle, E.J., McDonald, J.P., Jared, B.H., Brundage, A.L., and Michael, J.R.: Microenergetics: Characterization of sub-millimeter PETN films (35th International Pyrotechnics Seminar and Symposium, Ft. Collins, CO, 2008).Google Scholar
29.Wixom, R.R., Tappan, A.S., Brundage, A.L., Knepper, R., Ritchey, M.B., Michael, J.R., and Rye, M.J.: Characterization of pore morphology in molecular crystal explosives by focused ion-beam nanotomography. J. Mater. Res. 25, 1362 (2010).CrossRefGoogle Scholar
30.Nix, W.D. and Clemens, B.M.: Crystallite coalescence: A mechanism for intrinsic tensile stress in thin films. J. Mater. Res. 14, 3467 (1999).CrossRefGoogle Scholar
31.Zhang, G., Weeks, B., Gee, R., and Maiti, A.: Fractal growth in organic thin films: Experiments and modeling. Appl. Phys. Lett. 95, 204101 (2009).CrossRefGoogle Scholar
32.Thouless, M.D.: Combined buckling and cracking of films. J. Am. Ceram. Soc. 76, 2936 (1993).CrossRefGoogle Scholar
33.Zhang, G., Weeks, B.L., and Holtz, M.: Application of dynamic scaling to the surface properties of organic thin films: Energetic materials. Surf. Sci. 605, 463 (2011).CrossRefGoogle Scholar
34.Durr, A.C., Schreiber, F., Ritley, K.A., Kruppa, V., Krug, J., Dosch, H., and Struth, B.: Rapid roughening in thin film growth of an organic semiconductor (diindenoperylene). Phys. Rev. Lett. 90, 016104 (2003).CrossRefGoogle ScholarPubMed
35.Yim, S. and Jones, T.S.: Anomalous scaling behavior and surface roughening in molecular thin-film deposition. Phys. Rev. B 73, 161305 (2006).CrossRefGoogle Scholar
36.Zhang, X., Barrena, E., Goswami, D., de Oteyza, D.G., Weis, C., and Dosch, H.: Evidence for a layer-dependent Ehrlich-Schwobel barrier in organic thin film growth. Phys. Rev. Lett. 103, 136101 (2009).CrossRefGoogle ScholarPubMed
37.Chinh, P.D.: Elastic moduli of random aggregates of tetragonal crystals. Philos. Mag. A 82, 1713 (2002).CrossRefGoogle Scholar
38.Winey, J.M. and Gupta, Y.M.: Second-order elastic constants for pentaerythritol tetranitrate single crystals. J. Appl. Phys. 90, 1669 (2001).CrossRefGoogle Scholar