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Dielectric properties of plasma-spray-deposited BaTiO3 and Ba0.68Sr0.32TiO3 thick films

Published online by Cambridge University Press:  31 January 2011

K. Ahn ,
B. W. Wessels  and
S. Sampath
K. Ahn
Affiliation:
Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208
B. W. Wessels
Affiliation:
Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208
S. Sampath
Affiliation:
Department of Materials Science and Engineering, State University of New York (SUNY)-Stony Brook, Stony Brook, New York 11794
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Abstract

The dielectric properties of high-k dielectric BaTiO3 and Ba0.68Sr0.32TiO3 thick films deposited on alumina substrates using a plasma-spray process were investigated. The as-deposited films were predominantly crystalline but contained an amorphous second phase, the amount of which depended on spray conditions. The effect of the spray conditions on crystallinity was studied and related to the dielectric properties of the films. The presence of a low dielectric constant interfacial layer in plasma-spray-deposited films was determined from the dependence of the dielectric constant on film thickness. After annealing at 500 °C for 20 h in air, the crystallinity and dielectric constant increased. Annealing was also found to affect the interfacial layer properties.

Type
Articles
Information
Journal of Materials Research , Volume 18 , Issue 5 , May 2003 , pp. 1227 - 1231
Copyright
Copyright © Materials Research Society 2003

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