Hostname: page-component-78c5997874-lj6df Total loading time: 0 Render date: 2024-11-13T01:56:59.514Z Has data issue: false hasContentIssue false

The effect of porogen loading on the stiffness and fracture energy of brittle organosilicates

Published online by Cambridge University Press:  31 January 2011

Han Li
Affiliation:
School of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138
Youbo Lin
Affiliation:
School of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138
Ting Y. Tsui
Affiliation:
Chemical Engineering Department, University of Waterloo, Nanotechnology Institute, Waterloo, Ontario N2L 3G1, Canada
Joost J. Vlassak*
Affiliation:
School of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138
*
a) Address all correspondence to this author. e-mail: vlassak@esag.deas.harvard.edu
Get access

Abstract

Integrating porous low-permittivity dielectrics into Cu metallization is one of the strategies to reduce power consumption, signal propagation delays, and crosstalk between interconnects for the next generation of integrated circuits. The porosity and pore structure of these low-k dielectric materials, however, also affect other important material properties in addition to the dielectric constant. In this paper, we investigate the impact of porogen loading on the stiffness and cohesive fracture energy of a series of porous organosilicate glass (OSG) thin films using nanoindentation and the double-cantilever beam (DCB) technique. The OSG films were deposited by plasma-enhanced chemical vapor deposition (PECVD) and had a porosity in the range of 7−45%. We show that the degree of porogen loading during the deposition process changes both the network structure and the porosity of the dielectric, and we resolve the contributions of both effects to the stiffness and fracture energy of the films. The experimental results for stiffness are compared with micromechanical models and finite element calculations. It is demonstrated that the stiffness of the OSG films depends sensitively on their porosity and that considerable improvements in stiffness may be obtained through further optimization of the pore microstructure. The cohesive fracture energy of the films decreases linearly with increasing porosity, consistent with a simple planar through-pore fracture mechanism.

Type
Articles
Copyright
Copyright © Materials Research Society 2009

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1.O'Neill, M.L., Vrtis, R.N., Peterson, B.K., Haas, M.K., Weigel, S.J., Wu, D., Bitner, M.D., Karwacki, E.J.: Impact of pore size and morphology of porous organosilicate glasses on integrated circuit manufacturing, in Materials, Technology and Reliability of Low-k Dielectrics and Copper Interconnects, edited by T.Y. Tsui, Y-C. Joo, L. Michaelson, M. Lane, and A.A. Volinsky (Mater. Res. Soc. Symp. Proc. 914, Warrendale, PA, 2006), 0914-F01-02.CrossRefGoogle Scholar
2.Maex, K., Baklanov, M.R., Shamiryan, D., Iacopi, F., Brongersma, S.H., Yanovitskaya, Z.S.: Low dielectric constant materials for microelectronics. J. Appl. Phys. 93, 118793 2003CrossRefGoogle Scholar
3.Morgen, M., Ryan, E.T., Zhao, J.H., Hu, C., Cho, T.H., Ho, P.S.: Low dielectric constant materials for ULSI interconnects. Annu. Rev. Mater. Sci. 30, 645 2000CrossRefGoogle Scholar
4.Nemat-Nasser, S., Hori, M.: Micromechanics: Overall Properties of Heterogeneous Materials, 2nd rev. ed. Elsevier Amsterdam 1999Google Scholar
5.Roscoe, R.: The viscosity of suspensions of rigid spheres. Br. J. Appl. Phys. 3, 8267 1952CrossRefGoogle Scholar
6.Christensen, R.M., Lo, K.H.: Solutions for effective shear properties in 3 phase sphere and cylinder models. J. Mech. Phys. Solids 27, 4315 1979CrossRefGoogle Scholar
7.Benveniste, Y.: A new approach to the application of Mori-Tanaka theory in composite-materials. Mech. Mater. 6, 2147 1987CrossRefGoogle Scholar
8.Eshelby, J.D.: The determination of the elastic field of an ellipsoidal inclusion, and related problems. Proc. R. Soc. London, Ser. A 241, 1226 376 1957Google Scholar
9.Rice, R.W.: Evaluation and extension of physical property-porosity models based on minimum solid area. J. Mater. Sci. 31, 1102 1996CrossRefGoogle Scholar
10.Torquato, S.: Effective stiffness tensor of composite media. 1. Exact series expansions. J. Mech. Phys. Solids 45, 91421 1997CrossRefGoogle Scholar
11.Roberts, A.P., Garboczi, E.J.: Elastic properties of model porous ceramics. J. Am. Ceram. Soc. 83, 123041 2000CrossRefGoogle Scholar
12.Roberts, A.P., Garboczi, E.J.: Computation of the linear elastic properties of random porous materials with a wide variety of microstructure. Proc. R. Soc. London, Ser. A 458, 20211033 2002CrossRefGoogle Scholar
13.Vandeperre, L.J., Wang, J., Clegg, W.J.: Effects of porosity on the measured fracture energy of brittle materials. Philos. Mag. 84, 343689 2004CrossRefGoogle Scholar
14.Guyer, E.P., Patz, M., Dauskardt, R.H.: Fracture of nanoporous methyl silsesquioxane thin-film glasses. J. Mater. Res. 21, 4882 2006CrossRefGoogle Scholar
15.Lin, Y., Xiang, Y., Tsui, T.Y., Vlassak, J.J.: PECVD low-permittivity organosilicate glass coatings: Adhesion, fracture and mechanical properties. Acta Mater. 56, 174932 2008CrossRefGoogle Scholar
16.Baklanov, M.R., Mogilnikov, K.P., Polovinkin, V.G., Dultsev, F.N.: Determination of pore-size distribution in thin films by ellipsometric porosimetry. J. Vac. Sci. Technol., B 18, 31385 2000CrossRefGoogle Scholar
17.Lin, Y.B., Tsui, T.Y., Vlassak, J.J.: Octamethylcyclotetrasiloxane-based, low-permittivity organosilicate coatings—Composition, structure, and polarizability. J. Electrochem. Soc. 153, 7F144 2006CrossRefGoogle Scholar
18.Lin, Y.B., Xiang, Y., Tsui, T.Y., Vlassak, J.J.: PECVD low-permittivity organosilicate glass coatings: Adhesion, fracture and mechanical properties. Acta Mater. 56, 174932 2008CrossRefGoogle Scholar
19.Oliver, W.C., Pharr, G.M.: An improved technique for determining hardness and elastic-modulus using load and displacement sensing indentation experiments. J. Mater. Res. 7, 61564 1992CrossRefGoogle Scholar
20.Chen, X., Vlassak, J.J.: Numerical study on the measurement of thin film mechanical properties by means of nanoindentation. J. Mater. Res. 16, 102974 2001CrossRefGoogle Scholar
21.Kanninen, M.F.: Augmented double cantilever beam model for studying crack-propagation and arrest. Int. J. Fract. 9, 183 1973CrossRefGoogle Scholar
22.Li, S., Wang, J., Thouless, M.D.: The effects of shear on delamination in layered materials. J. Mech. Phys. Solids 52, 1193 2004CrossRefGoogle Scholar
23.Roberts, A.P., Garboczi, E.J.: Elastic properties of model random three-dimensional open-cell solids. J. Mech. Phys. Solids 50, 133 2002CrossRefGoogle Scholar
24.Vlassak, J.J., Lin, Y., Tsui, T.Y.: Fracture of organosilicate glass thin films: Environmental effects. Mater. Sci. Eng., A 391, 1–2159 2005CrossRefGoogle Scholar