Hostname: page-component-78c5997874-xbtfd Total loading time: 0 Render date: 2024-11-13T01:58:03.674Z Has data issue: false hasContentIssue false

Effects of Cr+ ion implantation on the oxidation of Ni3Al

Published online by Cambridge University Press:  31 January 2011

M. Chen
Affiliation:
Laboratory of Fatigue and Fracture for Materials, Institute of Metal Research, Academia Sinica, Shenyang 110015, People's Republic of China
S. Patu
Affiliation:
Laboratory of Fatigue and Fracture for Materials, Institute of Metal Research, Academia Sinica, Shenyang 110015, People's Republic of China
J.N. Shen
Affiliation:
Institute of Corrosion and Protection of Metals, Academia Sinica, Shenyang 1100115, People's Republic of China
C.X. Shi
Affiliation:
Laboratory of Fatigue and Fracture for Materials, Institute of Metal Research, Academia Sinica, Shenyang 110015, People's Republic of China
Get access

Abstract

Ni3Al samples were implanted with different doses of 150 keV Cr+ ions to modify the surface region. The high temperature oxidation behavior was tested. The surface layer structure was investigated by AES, TEM, XRD, and optical microscope before and after the test. The experimental results show that chromium ions turn a small amount of ordered superlattice Ni3Al phase into a disordered Ni–Al–Cr phase. Also there is a bcc chromium phase in the implanted sample. Implanted Ni3Al alloy has better oxidation resistance than the unimplanted one at 900 °C. The oxide layer is of a multilayer structure after 50 h oxidation, composed of a NiO inner layer, Cr2O3, spinel NiAl2O4 intermediate layers, and an α–Al2O3 external layer at the oxide/air interface. The α-Al2O3 and Cr2O3 are independent scale-like layers. The two protective layers improve the oxidation resistance significantly. The effects of implanted elements and possible reaction mechanisms are discussed.

Type
Articles
Copyright
Copyright © Materials Research Society 1993

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1Aoki, K.K. and Izumi, O., J. Jpn. Inst. Met. 43, 1190 (1979).CrossRefGoogle Scholar
2Stoloff, N. S., Int. Met. Rev. 34 (4), 1 (1989).CrossRefGoogle Scholar
3Liu, C. T. and Sikka, U. K., J. Met. 38, 19 (1986).Google Scholar
4Guo, J. T., Proc. Int. Workshop on Ordered Intermetallics, September 28-October 1, 1992, Hangzhou, China.Google Scholar
5Stott, F.H., Mater. Sci. Technol. 5, 734 (1989).CrossRefGoogle Scholar
6Giggins, C. S. and Pettit, F. S., Trans. Metall. Soc. AIME 245, 2495 (1969).Google Scholar
7Boggs, W. E., J. Electrochem. Soc. 118, 906 (1971).CrossRefGoogle Scholar
8Wood, C.G. and Stott, F.H., Br. Corros. J. 6, 247 (1971).CrossRefGoogle Scholar
9Irving, G. N., Stringer, J., and Whittle, D.P., Oxid. Met. 9, 427 (1975).CrossRefGoogle Scholar