Crossref Citations
This article has been cited by the following publications. This list is generated based on data provided by
Crossref.
Lu, Zhenyu
Ryde, Niels P.
Babu, S. V.
and
Matijević, Egon
2005.
Particle Adhesion Studies Relevant to Chemical Mechanical Polishing.
Langmuir,
Vol. 21,
Issue. 22,
p.
9866.
Gorantla, V. R. K.
Assiongbon, K. A.
Babu, S. V.
and
Roy, D.
2005.
Citric Acid as a Complexing Agent in CMP of Copper.
Journal of The Electrochemical Society,
Vol. 152,
Issue. 5,
p.
G404.
Andreescu, Daniel
Matijević, Egon
and
Goia, Dan V.
2006.
Formation of uniform colloidal ceria in polyol.
Colloids and Surfaces A: Physicochemical and Engineering Aspects,
Vol. 291,
Issue. 1-3,
p.
93.
Matijević, E.
and
Babu, S.V.
2008.
Colloid aspects of chemical–mechanical planarization.
Journal of Colloid and Interface Science,
Vol. 320,
Issue. 1,
p.
219.
Wang, Jun
and
Haerle, Andrew G.
2008.
Chemical mechanical planarization of copper using transition alumina nanoparticles.
Thin Solid Films,
Vol. 516,
Issue. 21,
p.
7648.
Meled, V.
Babu, S. V.
and
Matijević, E.
2009.
Chemical Mechanical Polishing of Methyl Silsesquioxane.
Journal of The Electrochemical Society,
Vol. 156,
Issue. 6,
p.
H460.
Pati, Ranjan K.
Lee, Ivan C.
Gaskell, Karen J.
and
Ehrman, Sheryl H.
2009.
Precipitation of Nanocrystalline CeO2 Using Triethanolamine.
Langmuir,
Vol. 25,
Issue. 1,
p.
67.
Deraz, N.M.
and
Alarifi, A.
2009.
Structural, Surface and Catalytic Properties of Nano-Sized Ceria Catalysts.
Adsorption Science & Technology,
Vol. 27,
Issue. 4,
p.
413.
Veera Dandu, P.R.
Devarapalli, V.K.
and
Babu, S.V.
2010.
Reverse selectivity – High silicon nitride and low silicon dioxide removal rates using ceria abrasive-based dispersions.
Journal of Colloid and Interface Science,
Vol. 347,
Issue. 2,
p.
267.
Wang, Jun
Cherian, Isaac K.
and
Haerle, Andrew G.
2010.
Chemical Mechanical Planarization of Tungsten with Hard Abrasives.
Electrochemical and Solid-State Letters,
Vol. 13,
Issue. 6,
p.
H182.
Coutinho, Cecil A.
and
Gupta, Vinay K.
2011.
Applied Plastics Engineering Handbook.
p.
519.
Chung, Sang-Ho
Lee, Dae-Won
Kim, Min-Sung
and
Lee, Kwan-Young
2011.
The synthesis of silica and silica–ceria, core–shell nanoparticles in a water-in-oil (W/O) microemulsion composed of heptane and water with the binary surfactants AOT and NP-5.
Journal of Colloid and Interface Science,
Vol. 355,
Issue. 1,
p.
70.
Pan, GuoShun
Gu, ZhongHua
Zhou, Yan
Li, Tuo
Gong, Hua
and
Liu, Yan
2011.
Preparation of silane modified SiO2 abrasive particles and their Chemical Mechanical Polishing (CMP) performances.
Wear,
Vol. 273,
Issue. 1,
p.
100.
Nolan, L.
and
Cadien, K.
2012.
Nanofabrication.
p.
239.
Lin, F.
Nolan, L.
Xu, Z.
and
Cadien, K.
2012.
A Study of the Colloidal Stability of Mixed Abrasive Slurries and Their Role in CMP.
Journal of The Electrochemical Society,
Vol. 159,
Issue. 5,
p.
H482.
Bensebaa, Farid
2013.
Nanoparticle Technologies - From Lab to Market.
Vol. 19,
Issue. ,
p.
429.
Cadien, K.
Nolan, L.
Pirayesh, H.
Dawkins, K.
and
Xu, Z.
2014.
Electrodeposition and Surface Finishing.
Vol. 57,
Issue. ,
p.
303.
Gulicovski, Jelena J.
Bračko, Ines
and
Milonjić, Slobodan K.
2014.
Morphology and the isoelectric point of nanosized aqueous ceria sols.
Materials Chemistry and Physics,
Vol. 148,
Issue. 3,
p.
868.
Srinivasan, Ramanathan
Dandu, Pradeep VR
and
Babu, S. V.
2015.
Shallow Trench Isolation Chemical Mechanical Planarization: A Review.
ECS Journal of Solid State Science and Technology,
Vol. 4,
Issue. 11,
p.
P5029.
Rafie Borujeny, E.
Dawkins, K.
Li, P.
Xu, Z.
and
Cadien, K.
2016.
Ceria coated silica particles: One step preparation and settling behaviour under the influence of colloidal and hydrodynamic interactions.
Materials Chemistry and Physics,
Vol. 173,
Issue. ,
p.
467.