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Effects of nitrogen flow rates on reactively sputtered nanocrystal-(Ti,Al)xN1-x/amorphous-SiyN1-y nanolaminate films

Published online by Cambridge University Press:  03 March 2011

Bao-Shun Yau ,
Jow-Lay Huang  and
Ding-Fwu Lii
Bao-Shun Yau
Affiliation:
Department of Materials Science and Engineering, National Cheng-Kung University, Tainan 701, Taiwan, Republic of China
Jow-Lay Huang*
Affiliation:
Department of Materials Science and Engineering, National Cheng-Kung University, Tainan 701, Taiwan, Republic of China
Ding-Fwu Lii
Affiliation:
Department of Electrical Engineering, Cheng Shiu University, Kaohsiung 833, Taiwan, Republic of China
*
a)Address all correspondence to this author. e-mail: JLH888@mail.ncku.edu.tw
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Abstract

Nanocrystal-(Ti,Al)xN1-x/amorphous-SiyN1-y nanolaminate films were deposited periodically under different nitrogen flow rates. The composition, microstructure and mechanical properties of nanolaminate films were investigated by x-ray photoelectron spectroscope, x-ray diffractometer, scanning and transmission electron microscopy, atomic force microscope, and nanoindentation apparatus. Results indicated that the formation of the compound on the target surface was substantially influenced by the deposition rate, composition and crystallite size of the nanolaminate films. Nanolaminate structure with periodic compositional modulation and sharp interfaces were deposited at different nitrogen flow rate. Smaller nanocrystallite size, round-shaped grain features, smoother surface morphology, higher hardness, and reduced elastic modulus were obtained for nanolaminate films with increasing the nitrogen flow rate.

Keywords

SputteringMicrostructureHardness
Type
Articles
Information
Journal of Materials Research , Volume 19 , Issue 8 , August 2004 , pp. 2322 - 2329
Copyright
Copyright © Materials Research Society 2004

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