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Elastic flexure of bilayered beams subject to strain differentials

Published online by Cambridge University Press:  31 January 2011

T-J. Chuang
Affiliation:
Ceramics Division, National Institute of Standards and Technology, Gaithersburg, Maryland 20899–8521
S. Lee
Affiliation:
Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu, Taiwan 30043
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Abstract

The residual stresses present in a thin film and the curvature formed at its substrate during deposition have been a great concern to electrochemists and process engineers. Here a new hybrid analytical method is presented to reanalyze the flexural problem subjected to a strain differential in the general case. It was shown that the present solutions for ultrathin films agree with Stoney's equation. Moreover, single or dual neutral axes resulted, depending on materials and thickness ratios between the film and the substrate. Quantitative differences with others in the solutions of deformed curvature and residual stress are discussed in a representative case of GaAs top coat/Si substrate wafers.

Type
Articles
Copyright
Copyright © Materials Research Society 2000

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References

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