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Exploration of the deposition of submicrometer particles by spin-coating

Published online by Cambridge University Press:  03 March 2011

C. Doornkamp ,
C. Laszlo ,
W. Wieldraaijer  and
E.W. Kuipers
C. Doornkamp*
Affiliation:
Koninklijke/Shell Laboratorium Amsterdam, P.O. Box 38000, 1030 BN Amsterdam, The Netherlands
C. Laszlo
Affiliation:
Koninklijke/Shell Laboratorium Amsterdam, P.O. Box 38000, 1030 BN Amsterdam, The Netherlands
W. Wieldraaijer
Affiliation:
Koninklijke/Shell Laboratorium Amsterdam, P.O. Box 38000, 1030 BN Amsterdam, The Netherlands
E.W. Kuipers
Affiliation:
Koninklijke/Shell Laboratorium Amsterdam, P.O. Box 38000, 1030 BN Amsterdam, The Netherlands
*
a)Present address: Gorlaeus Laboratories, P.O. Box 9502, 2300 RA Leiden, The Netherlands.
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Abstract

The deposition of Cu, Zn, Pt, and Co precursor particles from solution onto a flat silicon wafer using a spin coater was studied. Homogeneously distributed monodisperse particles can be obtained. The dependence of particle size and number density on solution concentration and rotation frequency was investigated. Different solvents and support modifications were studied. The particles were analyzed using dark-field microscopy, scanning electron microscopy, and atomic force microscopy.

Type
Articles
Information
Journal of Materials Research , Volume 10 , Issue 2 , February 1995 , pp. 411 - 424
Copyright
Copyright © Materials Research Society 1995

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References

REFERENCES

1Weller, H., Angew. Chem. Int. Ed. Engl. 32, 41 (1993).CrossRefGoogle Scholar
2Haruta, M., Tsubota, S., Kobayashi, T., Kageyama, H., Genet, M. J., and Delmon, B., J. Cat. 144, 175 (1993).CrossRefGoogle Scholar
3Satterfield, C. N., Heterogeneous Catalysis in Industrial Practice, 2nd ed. (McGraw-Hill, New York, 1991), pp. 87–124.Google Scholar
4Poppa, H., Cat. Rev. Sci. Eng. 35, 359 (1993).CrossRefGoogle Scholar
5Flack, W. W., Soong, D. S., Bell, A. T., and Hess, D. W., J. Appl. Phys. 56, 1199 (1984).CrossRefGoogle Scholar
6Kuipers, E. W., Laszlo, C., and Wieldraaijer, W., Cat. Lett. 17, 71 (1993).CrossRefGoogle Scholar
7Jem, W., J. Electrochem. Soc. 137, 1887 (1990).Google Scholar
8Graf, D., Grundner, M., Schulz, R., and Muhlhoff, L., J. Appl. Phys. 68, 5155 (1990).CrossRefGoogle Scholar
9Meyerhofer, D., J. Appl. Phys. 49, 3993 (1978).CrossRefGoogle Scholar
10Van Wijk, R., Gijzeman, O. L. J., and Geus, J. W., Cat. Lett. 24, 171 (1994).CrossRefGoogle Scholar
11van den Berg, R., Groesbeek, N., Knoester, A., Chen, Z. X., and Kuipers, E. W., unpublished.Google Scholar
12Her, R. K., Chemistry of Silica (John Wiley, New York, 1979), p. 645.Google Scholar
13Weast, R. C., Handbook of Chemistry and Physics, 71st ed. (Chemical Rubber Co., Cleveland, OH, 1990), pp. 6–8.Google Scholar
14Berry, R. J., Surf. Sci. 76, 415 (1978).CrossRefGoogle Scholar
15Hansen, M., Constitution of Binary Alloys, 2nd ed. (McGraw-Hill, New York, 1958), p. 1140.Google Scholar
16Pretorius, R., Harris, J. M., and Nicolet, M. A., Solid State El. 21, 667 (1978).CrossRefGoogle Scholar
17Tu, K. N. and Mayer, J. W., Thin Films Interdiffusion and Reaction, edited by Poate, J. M., Tu, K. N., and Mayer, J. W. (John Wiley, New York, 1977), Chap. 10.Google Scholar
18Wieldraaijer, W., van Balen Blanken, J., and Kuipers, E.W., J. Cryst. Growth 126, 305 (1993).CrossRefGoogle Scholar
19Pooley, CM. and Tabor, D., Proc. R. Soc. London A 329, 251 (1972).Google Scholar
20Dietz, P., Hansma, P. K., Ihn, K. J., Motamedi, F., and Smith, P., J. Mater. Sci. 28, 1372 (1993).CrossRefGoogle Scholar
21Kuipers, E. W., Doornkamp, C., Wieldraaijer, W., and van den Berg, R. E., Chem. Mater. 5, 1367 (1993).CrossRefGoogle Scholar
22Mullin, J. W., Crystallization, 2nd ed. (Butterworths, London, 1972), pp. 172–176.Google Scholar
23van Hardeveld, R. M., Gunter, P. L. J., van Ijzendoorn, L. J., Kuipers, E. W., and Niemantsverdriet, J. W., unpublished.Google Scholar
24von Karman, T., Z. Angew. Math. Mech. 1, 244 (1921).Google Scholar
25Cochran, W. G., Proc. Cambridge Philos. Soc. 30, 365 (1934).CrossRefGoogle Scholar