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Gas-phase diffusion and surface reaction as limiting mechanisms in the aerosol-assisted chemical vapor deposition of TiO2 films from titanium diisopropoxide

Published online by Cambridge University Press:  03 March 2011

A. Conde-Gallardo ,
M. Guerrero ,
R. Fragoso  and
N. Castillo
A. Conde-Gallardo*
Affiliation:
Departamento de Física, Centro de Investigación y de Estudios Avanzados del IPN, México Distrito Federal 07360, México
M. Guerrero
Affiliation:
Departamento de Física, Centro de Investigación y de Estudios Avanzados del IPN, México Distrito Federal 07360, México
R. Fragoso
Affiliation:
Departamento de Física, Centro de Investigación y de Estudios Avanzados del IPN, México Distrito Federal 07360, México
N. Castillo
Affiliation:
Departamento de Física, Centro de Investigación y de Estudios Avanzados del IPN, México Distrito Federal 07360, México
*
a) Address all correspondence to this author. e-mail: aconde@fis.cinvestav.mx
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Abstract

Titanium dioxide thin films were deposited on crystalline silicon (100) substrates by delivering a liquid aerosol of titanium-diisopropoxide. The evidence of a metalorganic chemical vapor deposition process observed in the crystalline and morphological features of the films is strongly supported by the behavior of the growth rate rg as a function of the deposition temperature. The rg line shape indicates that in a wide range of temperatures (∼180–400 °C), the film formation is limited by both gas-phase diffusion of some molecular species toward the substrate surface and the thermal reaction of those species on that surface. The activation energy EA that characterizes the surface reaction depends somewhat on the precursor concentration; a fitting procedure to an equation that takes into account both limiting mechanisms (gas-phase diffusion + surface reaction) yields EA ≃ 27.6 kJ/mol.

Keywords

Metalorganic depositionSpray pyrolysisSurface reaction
Type
Articles
Information
Journal of Materials Research , Volume 21 , Issue 12 , December 2006 , pp. 3205 - 3209
Copyright
Copyright © Materials Research Society 2006

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References

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