Published online by Cambridge University Press: 31 January 2011
High-quality Hg1−xCdxTe epilayers on CdTe buffer layers were grown by molecular beam epitaxy using various growth methods. The reflection high-energy electron diffraction, scanning electron microscopy, and atomic force microscopy measurements showed that the crystallinity and electrical properties of the Hg1−xCdxTe epilayers grown on CdTe buffer layers deposited by using a two-step annealing growth method were improved. These results indicate that high-quality Hg1−xCdxTe films can be obtained by using CdTe buffer layers grown by the two-step annealing growth method and that the grown Hg1−xCdxTe epilayers hold promise for potential applications in optoelectronic devices in the area of infrared detectors.