Hostname: page-component-cd9895bd7-hc48f Total loading time: 0 Render date: 2024-12-28T01:17:01.841Z Has data issue: false hasContentIssue false

Incipient yielding behavior during indentation for gold thin films before and after annealing

Published online by Cambridge University Press:  03 March 2011

David C. Miller*
Affiliation:
Department of Mechanical Engineering, University of Colorado, Boulder, Colorado 80309-0427
Mellisa J. Talmage
Affiliation:
Department of Mechanical Engineering, University of Colorado, Boulder, Colorado 80309-0427
Ken Gall
Affiliation:
School of Materials Science and Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332-0245
*
a) Address all correspondence to this author. e-mail: dcm@colorado.edu
Get access

Abstract

We studied the deformation mechanisms and mechanics during indentation of polycrystalline gold thin films at depths below 100 nm. The measured material hardness decreased from 2.1 ± 0.1 to 1.7 ± 0.1 GPa after annealing for 4 h at 177 °C. Upon closer inspection, the hardness trends in the gold thin films were discovered to vary according to the indentation depth. At nanometer depths, the material hardness was quantified using multiple parameters, some of which were independent of the area calibration for the tip. The annealed specimen was very “hard” at low indentation depths, relatively soft at moderate indentation depths, and finally harder until the grain-size limit was reached. The as-deposited specimen demonstrated a relatively continuous harness trend as function of indentation depth, exhibiting monotonic convergence to Hall–Petch limited behavior. Discrete displacement jump events (excursions or “pop-ins”) were frequently observed for the annealed specimen but not for the as-deposited specimen. Variation in hardness, excursion activity, and displacement during the hold at maximum load was observed according to the applied loading, which was parametrically varied at constant strain rates. Hardness results are explained in terms of the population and evolution of defects present within the specimens. The population of point defects is also influential, and critical thermal fluctuations, as well as the thermally activated process of diffusion, are believed to influence hardness at the specimen’s free surface and further into its volume. After converging to a monotonic trend (proper tip engagement), the modulus of the gold was measured to be 106.0 ± 12.9 and 101.3 ± 6.0 GPa for the respective Au/Cr/Si specimens. These values exceeded predictions from the aggregate polycrystalline material theory, a representation used to estimate results for anisotropic single crystals. Exaggerated modulus measurements are explained as the result of the contribution of modulus mismatch with the substrate, pileup at the indentor tip, residual stress in the films, and crystallographic anisotropy of the gold.

Type
Articles
Copyright
Copyright © Materials Research Society 2006

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1.Smith, J.F., Zheng, S.: High temperature nanoscale mechanical property measurements. Surf. Eng. 16, 143 (2000).CrossRefGoogle Scholar
2.Ohmura, T., Matsuoka, S., Tanaka, K., Yoshida, T.: Nanoindentation load-displacement behavior of pure face centered cubic metal thins films on a hard substrate. Thin Solid Films 385, 198 (2001).CrossRefGoogle Scholar
3.Xie, C., Emery, R.D., Yang, S.Y., Tong, W. Mechanical properties and stresses in thin gold films on a silicon substrate, in Thin Films: Stresses and Mechanical Properties IX, edited by Ozkan, C.S., Freund, L.B., Cammarata, R.C., and Gao, H. (Mater. Res. Soc. Symp. Proc. 695, Warrendale, PA, 2002 L5.2. p. 197.Google Scholar
4.Moody, N.R., Adams, D.P., Headley, T., Yang, N., Volinsky, A.: Effects of diffusion on interfacial fracture of gold-chromium hybrid. Int. J. Fract. 119, 407 (2003).CrossRefGoogle Scholar
5.Lilleodden, E.T., Zimmerman, J.A., Foiles, S.M., Nix, W.D.: Atomistic simulations of elastic deformation and dislocation nucleation during nanoindentation. J. Mech. Phys. Solids 51, 901 (2003).CrossRefGoogle Scholar
6.San Marchi, C., Moody, N.R., Cordill, M.J., Lucadamo, G., Kelly, J.J., Headley, T., Yang, N. Structure-property relationships of Au films electrodeposited on Ni, in Nanoscale Materials and Modeling—Relations Among Processing. Microstructure and Mechanical Properties, edited by Anderson, P.M., Foecke, T., Misra, A., and Rudd, R.E. (Mater. Res. Soc. Symp. Proc. 821, Warrendale, PA 2004 P2.8, p. 5.Google Scholar
7.Volinsky, A.A., Moody, N.R., Gerberich, W.W.: Nanoindentation of Au and Pt/Cu thin films at elevated temperatures. J. Mater. Res. 19, 2650 (2004).CrossRefGoogle Scholar
8.Nix, W.D., Greer, J.R., Feng, G., Lilleodden, E.T.: Deformation at the nanometer and micrometer length scales: Effects of strain gradients and dislocation starvation. JOM 56, 88 (2004).Google Scholar
9.Lilleodden, E.T., Nix, W.D.: Microstructural length-scale effects in the nanoindentation behavior of thin gold films. Acta Mater. 56, 1583 (2006).CrossRefGoogle Scholar
10.Shukla, P., Sikder, A.K., Zantye, P.B., Kumar, A., Sanganaria, M. Effect of annealing on the structural, mechanical, and tribological properties of electroplated Cu thin films, in Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics—2004, edited by Carter, R.J., Hau-Riege, C.S., Kloster, G.M., Lu, T.-M., and Schulz, S.E. (Mater. Res. Soc. Symp. Proc. 812, Warrendale, PA, 2004), F3.16, p. 171.Google Scholar
11.Srinivassarao, V., Jayaganthan, R., Sekhar, V.N., Mohankumar, K., Tay, A.A.O. Nanoindentation study of the sputtered Cu thin films for interconnect applications, in Proc. IEEE Elect. Pack. Technol. Conf., edited by Carter, R., Hau-Riege, C., Kloster, G., Lu, T-M., and Schulz, S. (IEEE, Piscataway, NJ, 2004), p. 343.Google Scholar
12.Knapp, J.A., Follstaedt, D.M., Meyers, S.M., Barbour, J.C., Friedman, T.A.: Finite-element modeling of nanoindentation. J. Appl. Phys. 85, 1460 (1999).CrossRefGoogle Scholar
13.Shugurov, A., Panin, A., Chun, H.G., Oskomov, K.Surface morphology, microstructure and mechanical properties of thin Ag films. Proc. KORUS 11, 21 (2003).Google Scholar
14.Winter, R.E.: Effect of thickness on the plastic deformation of (100) silver films. Philos. Mag. 29, 513 (1974).CrossRefGoogle Scholar
15.Page, T.F., Oliver, W.C., McHargue, C.J.: The deformation behavior of ceramic crystals subjected to very low load (Nano)indentations. J. Mater. Res. 7, 450 (1992).CrossRefGoogle Scholar
16.Kielly, J.D., Houston, J.E.: Nanomechanical properties of Au (111), (001), and (110) surfaces. Phys. Rev. B 57, 12588 (1998).CrossRefGoogle Scholar
17.Kramer, D.E., Yoder, K.B., Gerberich, W.W.: Surface constrained plasticity: Oxide rupture and the yield point process. Philos. Mag. A 81, 2033 (2001).CrossRefGoogle Scholar
18.Domnich, V., Ge, D., Gogotsi, Y. Indentation-induced phase transformations in semiconductors, in High-Pressure Surface Science and Engineering, edited by Domnich, V. and Gogotsi, Y. (IOP, Philadelphia, PA 2004) p. 381.Google Scholar
19.Gane, N., Cox, J.M.: The micro-hardness of metals at very low loads. Philos. Mag. 22, 881 (1970).CrossRefGoogle Scholar
20.Pethica, J.B., Hutchinson, R., Oliver, W.C.: Hardness measurement at penetration depths as small as 20 nm. Philos. Mag. A 48, 593 (1983).CrossRefGoogle Scholar
21.Pharr, G.M., Oliver, W.C.: Nanoindentation of silver—Relations between hardness and dislocation structure. J. Mater. Res. 4, 94 (1989).CrossRefGoogle Scholar
22.Hutchinson, J.W.: Plasticity at the micron scale. Int. J. Solid Struct. 37, 225 (2000).CrossRefGoogle Scholar
23.Schuh, C.A., Mason, J.K., Lund, A.C.: Quantitative insight into dislocation nucleation from high-temperature nanoindentation experiments. Nat. Mater. 41, 617 (2005).CrossRefGoogle Scholar
24.Koester, D., Cowen, A., Mahadevan, R., Stonefeild, M., Hardy, B.: Poly-MUMPs Design Handbook, Revision 10 (MEMSCAP Inc., Research Triangle Park, NC, 2003).Google Scholar
25.Miller, D.C., Herrmann, C.F., Maier, H.J., George, S.M., Stoldt, C.R., Gall, K.: Thermo-mechanical evolution of multilayer thin films, Part 2. Microstructure evolution in the metallic layers. Thin Solid Films (in press).Google Scholar
26.Joslin, D.L., Oliver, W.C.: A new method for analyzing data from continuous depth-sensing microindentation tests. J. Mater. Res. 5, 123 (1990).CrossRefGoogle Scholar
27.Oliver, W.C., Pharr, G.M.: Measurement of hardness and elastic modulus by instrumented indentation: Advances in understanding and refinements to methodology. J. Mater. Res. 19, 3 (2004).CrossRefGoogle Scholar
28.Strader, J.H., Shim, S., Bei, H., Oliver, W.C., Pharr, G.M. An experimental evaluation of the constant β relating the contact stiffness to the contact area in nanoindentation, in Fundamentals of Nanoindentation and Nanotribology III, edited by Wahl, K.J., Huber, N., Mann, A.B., Bahr, D.F., and Cheng, Y-T. (Mater. Res. Soc. Symp. Proc. 841, Warrendale, PA, 2005), R1.4, p. 9.Google Scholar
29.Lucas, B.N., Oliver, W.C.: Indentation power-law creep of high purity films. Metall. Trans. A 30, 601 (1999).CrossRefGoogle Scholar
30.Pharr, G.M., Oliver, W.C.: Measurement of thin-film mechanical-properties using nanoindentation. MRS Bull. 17(7), 28 (1992).CrossRefGoogle Scholar
31.Cheng, Y.T., Cheng, C.M.: What is indentation hardness? Surf. Coat. Technol. 133–134,417 (2000).CrossRefGoogle Scholar
32.Riney, T.D.: Residual thermoelastic stresses in bonded silicon wafers. J. Appl. Phys. 32(3), 454 (1961).CrossRefGoogle Scholar
33.Meyers, M.A., Chawla, K.K.: Mechanical Behavior of Materials (Prentice-Hall, Upper Saddle River, NJ, 1999), pp. 8891.Google Scholar
34.Levy, M.: Handbook of Elastic Properties of Solids, Liquids, and Gases: Volume II Elastic Properties of Solids (Academic Press, San Diego, CA, 2001).Google Scholar
35.Vlassak, J.J., Nix, W.D.: Measuring the elastic properties of anisotropic materials by means of indentation experiments. J. Mech. Phys. Solids 42, 1223 (1994).CrossRefGoogle Scholar
36.Vlassak, J.J., Ciavarella, M., Barber, J.R., Wang, X.: The indentation modulus of elastically anisotropic materials for indentors of arbitrary shape. J. Mech. Phys. Solids 51, 1701 (2002).CrossRefGoogle Scholar
37.Hill, R.: The elastic behavior of crystalline aggregate. Proc. Phys. Soc. A 65, 349 (1952).CrossRefGoogle Scholar
38.Nowak, R., Sakai, M.: The anisotropy of surface deformation of sapphire: Continuous indentation of triangular indentor. Acta Mater. 42, 2879 (1994).CrossRefGoogle Scholar
39.Fischer-Cripps, A.: Nanoindentation (Springer, New York, 2002).CrossRefGoogle Scholar
40.Johnson, K.L.: Contact Mechanics (Cambridge University Press, Cambridge, UK, 1985).CrossRefGoogle Scholar
41.McGurk, M.R., Page, T.F.: Using the P-δ2 analysis to deconvolute the nanoindentation response of hard-coated systems. J. Mater. Res. 14, 2283 (1999).CrossRefGoogle Scholar
42.Page, T.F., Pharr, G.M., Hay, J.C., Oliver, W.C., Lucas, B.N., Herbert, E., Riester, L. Nanoindention characterization of coated systems: P:S2—A new approach using the continuous stiffness technique, in Fundamentals of Nanoindentation and Nanotribology, edited by Moody, N.R., Gerberich, W.W., Burnham, N., and Baker, S.P. (Mater. Res. Soc. Symp. Proc. 522, Warrendale, PA, 1998), pp. 5364.Google Scholar
43.Hall, E.O.The deformation and ageing of mild steel: III. Discussion of results. Proc. Phys. Soc. B 64, 747 (1951).CrossRefGoogle Scholar
44.Petch, N.J.: The cleavage strength of polycrystals. JISI. 173, 25 (1953).Google Scholar
45.Tabor, D.: The Hardness of Materials (Claredon Press, Oxford, UK, 1951), pp. 174.Google Scholar
46.Bolhshakov, A., Pharr, G.M.: Influence of pileup on the measurement of mechanical properties by load and depth sensing indentation techniques. J. Mater. Res. 13, 1049 (1998).CrossRefGoogle Scholar
47.http://www.matweb.com, (Automation Creations, Inc., Blacksburg, VA), accessed March 22, 2006.Google Scholar
48.Emery, R.D., Povirk, G.L.: Tensile behavior of free-standing gold films. Part I. Coarse grained films. Acta Mater. 51, 2067 (2003).CrossRefGoogle Scholar
49.Wagar, H.N. in Integrated Device and Connection Technology, Vol. III, edited by Everitt, W. (Prentice-Hall, Englewood Cliffs, NJ, 1971), pp. 469473.Google Scholar
50.Mitra, R., Hoffman, R.A., Madan, A., Weertman, J.R.: Effect of process variables on the structure, residual stress, and hardness of sputtered nanocrystalline nickel films. J. Mater. Res. 16, 1010 (2001).CrossRefGoogle Scholar
51.Winter, R.E.: Effect of thickness on the plastic deformation of (100) silver films. Philos. Mag. 29, 513 (1974).CrossRefGoogle Scholar
52.Mencik, J., Munz, D., Quandt, E., Weppelmann, E.R.: Determination of elastic modulus of thin layers using nanoindentation. J. Mater. Res. 12, 2475 (1997).CrossRefGoogle Scholar
53.Jarausch, K.F., Kiely, J.D., Houston, J.E., Russell, P.E. The correlation of stress-state and nano-mechanical properties in Au, in Fundamentals of Nanoindentation and Nanotribology, edited by Moody, N.R., Gerberich, W.W., Burnham, N., and Baker, S.P. (Mater. Res. Soc. Symp. Proc. 522, Warrendale, PA, 1998), pp. 119124.Google Scholar
54.Baker, S.P., Kretschman, A., Artz, E.: Thermomechanical behavior of different texture components in Cu thin films. Acta Mater. 49, 2145 (2001).CrossRefGoogle Scholar