Hostname: page-component-cd9895bd7-dk4vv Total loading time: 0 Render date: 2025-01-02T21:01:27.079Z Has data issue: false hasContentIssue false
  • English
  • Français

Isotopic effects in a–C:(H/D) films deposited from methane/hydrogen RF plasmas

Published online by Cambridge University Press:  31 January 2011

D. Boutard  and
W. Möller
D. Boutard
Affiliation:
Max-Planck-Institut für Plasmaphysik, EURATOM Association, D-8046 Garching, Federal Republic of Germany
W. Möller
Affiliation:
Max-Planck-Institut für Plasmaphysik, EURATOM Association, D-8046 Garching, Federal Republic of Germany
Get access

Abstract

Hard amorphous hydrocarbon films have been deposited by RF glow discharges in methane/hydrogen mixtures with different hydrogen isotopes. For CH4 + D2 and CD4 + H2 gas mixtures, the film growth rate, the density, the refractive index, and the isotopic hydrogen content are obtained as functions of the process gas composition. Further, the hydrogen loss induced by 15 keV helium ions is studied. The results are qualitatively interpreted in terms of different effects of ion bombardment during film deposition which influence the properties of the resulting films.

Type
Diamond and Diamond-Like Materials
Information
Journal of Materials Research , Volume 5 , Issue 11 , November 1990 , pp. 2451 - 2455
Copyright
Copyright © Materials Research Society 1990

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1Angus, J. C., Koidl, P., and Domitz, S., in Plasma Deposited Thin Films, edited by Mort, J. and Jansen, F. (CRC Press, Boca Raton, FL, 1985), p. 89.Google Scholar
2Couderc, P. and Catherine, Y., Thin Solid Films 146, 93 (1987).CrossRefGoogle Scholar
3Tsai, H. C. and Bogy, D. B., J. Vac. Sci. Technol. A5, 3287 (1987).CrossRefGoogle Scholar
4Weissmantel, C., Ackermann, E., Bewilogua, K., Hecht, G., Kupfer, H., and Rau, B., J. Vac. Sci. Technol. A4, 2892 (1986).CrossRefGoogle Scholar
5Ugolini, D., Eitle, J., Oelhafen, P., and Wittmer, M., Appl. Phys. A48, 549 (1989).CrossRefGoogle Scholar
6Möller, W., J. Nucl. Mater. 162–164, 138 (1989).CrossRefGoogle Scholar
7Tachibana, K., Nishida, M., Harima, H., and Urano, Y., J. Phys. D 17, 1727 (1984).CrossRefGoogle Scholar
8Kline, L. E., Partlow, W. D., and Bies, W. E., J. Appl. Phys. 65, 70 (1989).CrossRefGoogle Scholar
9Smolinsky, G. and Vasile, M. J., Int. J. Mass Spectr. Ion Phys. 16, 137 (1975).CrossRefGoogle Scholar
10Vasile, M. J. and Smolinsky, G., Int. J. Mass Spectr. Ion Phys. 18, 179 (1975).CrossRefGoogle Scholar
11Toyoda, H., Kojima, H., and Sugai, H., Appl. Phys. Lett. 54, 1507 (1989).CrossRefGoogle Scholar
12Vandentop, G.L., Kawasaki, M., Nix, R.M., Brown, I.G., Salmeron, M., and Somorjai, G. A., Phys. Rev. B 41, 3200 (1990).CrossRefGoogle Scholar
13Boutard, D., Scherzer, B.M.U., and Möller, W., J. Appl. Phys. 65, 3833 (1989).CrossRefGoogle Scholar
14Sander, P., Altebockwinkel, M., Storm, W., Wiedmann, L., and Benninghoven, A., J. Vac. Sci. Technol. B7, 517 (1989).CrossRefGoogle Scholar
15Wild, Ch., Wagner, J., and Koidl, P., J. Vac. Sci. Technol. A5, 2227 (1987).CrossRefGoogle Scholar
16Wild, C., Koidl, P., and Wagner, J., in Amorphous Hydrogenated Carbon Films, edited by Koidl, P. and Oelhafen, P. (E. Mater. Res. Soc. Symp. Proc. 17, Les Editions de Physique, Les Ulis, France, 1987), p. 137.Google Scholar
17Kobayashi, K., Mutsukura, N., and Machi, Y., in Proc. 8th Int. Symp. on Plasma Chemistry, Intern. Union of Pure and Applied Chemistry, Tokyo, 1987.Google Scholar
18Pellicori, S. F., Peterson, C. M., and Henson, T. P., J. Vac. Sci. Technol. A4, 2350 (1986).CrossRefGoogle Scholar
19Weissmantel, C., J. Vac. Sci. Technol. 18, 179 (1981).CrossRefGoogle Scholar
20Möller, W. and Scherzer, B. M. U., J. Appl. Phys. 64, 4860 (1988).CrossRefGoogle Scholar
21Boutard, D., Möller, W., and Scherzer, B. M. U., J. Appl. Phys. 67, 163 (1990).CrossRefGoogle Scholar
22Boutard, D., Möller, W., and Scherzer, B. M. U., Rad. Eff. Def. Sol. (in press).Google Scholar
23Angus, J. C., Stultz, J. E., Shiller, P. J., MacDonald, J. R., Mirtich, M. J., and Domitz, S., Thin Solid Films 118, 311 (1984).CrossRefGoogle Scholar
24Dischler, B., Bubenzer, A., and Koidl, P., Solid State Commun. 48, 105 (1983).CrossRefGoogle Scholar