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Lattice location and hardness of Ta-implanted Ni3Al

Published online by Cambridge University Press:  31 January 2011

Gary S. Was ,
Siegfried Mantl  and
Warren Oliver
Gary S. Was
Affiliation:
Institut für Schicht-und Ionentechnik, Kernforschungsanlage Jülich GmbH, D-5170, Jülich, Germany
Siegfried Mantl
Affiliation:
Institut für Schicht-und Ionentechnik, Kernforschungsanlage Jülich GmbH, D-5170, Jülich, Germany
Warren Oliver
Affiliation:
Metals and Ceramics Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831
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Abstract

Implantation of Ta into single crystal Ni3Al was conducted to determine the degree of surface hardening in monolithic alloys in relation to its lattice location. Ta was implanted at 400 keV to doses of 0.07, 0.36, and 2.52 × 1016 cm−2 along the [100] axis of a [100] crystal of Ni3Al at room temperature. Composition versus depth profiles were determined by RBS, and lattice location of Ta was determined by channeling angular yield scans about the [100] axis. The hardness of the surface was measured by ultra-low load indentation. Results show that implantation softens the surface and that the Ta is randomly distributed between Ni and Al sites. Annealing at 1000 °C/1 h significantly reduces the damage and causes preferential occupation of Al sites by Ta, resulting in a slight increase in surface hardness. Further annealing at 1200 °C/0.25 h increases the surface hardness substantially and increases occupation of Al lattice sites to roughly 84%. Results are consistent with a model in which the as-implanted surface is softened by disordering, and subsequent diffusion of Ta to Al sites during thermal treatment causes hardening of the surface.

Type
Articles
Information
Journal of Materials Research , Volume 6 , Issue 6 , June 1991 , pp. 1200 - 1206
Copyright
Copyright © Materials Research Society 1991

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