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Local epitaxy of YBa2Cu3Ox on polycrystalline Ni measured by x-ray microdiffraction

Published online by Cambridge University Press:  03 March 2011

E.D. Specht ,
A. Goyal  and
W. Liu
E.D. Specht*
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, Tennessee, 37831
A. Goyal
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, Tennessee, 37831
W. Liu
Affiliation:
Oak Ridge National Laboratory, Oak Ridge, Tennessee, 37831
*
a) Address all correspondence to this author. e-mail: spechted@ornl.gov
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Abstract

Polychromatic synchrotron x-ray microdiffraction is used to determine the epitaxy of YBa2Cu3Ox (YBCO) films grown on polycrystalline Y.15Zr.85O1.925/CeO2/Y2O3/Ni95W5(Ni) rolling-assisted, biaxially textured substrates (RABiTS). A novel analysis technique is introduced in which the orientation of mosaic films is measured by using a Hough transform to recognize arcs in Laue microdiffraction patterns that correspond to low-index zone axes. While the overall epitaxy is cube-on-cube, grain-by-grain analysis reveals a systematic misorientation of YBCO with respect to Ni: the YBCO [001] rotates toward the direction of the surface normal. The crystal mosaic (for rotation about the rolling direction) measured by a single diffraction pattern sampling a 0.5-μm2 surface area is 0.7° full width at half-maximum for YBCO grown on Ni grains with a low tilt; for more highly tilted grains, the YBCO patterns can no longer be measured, presumably due to the large mosaic. The YBCO mosaic over the entire area of a Ni grain is ∼2.5° and varies with grain size; the mosaic is smaller for larger grains.

Keywords

EpitaxySuperconductingX-ray diffraction (XRD)
Type
Articles
Information
Journal of Materials Research , Volume 22 , Issue 3 , March 2007 , pp. 664 - 674
Copyright
Copyright © Materials Research Society 2007

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