Hostname: page-component-78c5997874-t5tsf Total loading time: 0 Render date: 2024-11-14T17:28:25.120Z Has data issue: false hasContentIssue false
  • English
  • Français

Microstructure and Chemistry of Annealed Al–Cu–Fe–Cr Quasicrystalline Approximant Coatings

Published online by Cambridge University Press:  03 March 2011

M.J. Daniels ,
J.S. Zabinski ,
H. Wu ,
C.R.M. Grovenor  and
J.C. Bilello
M.J. Daniels*
Affiliation:
Center for Nanomaterials Science, Department of Materials Science and Engineering,University of Michigan, Ann Arbor, Michigan 48109-2136
J.S. Zabinski
Affiliation:
Air Force Research Laboratory, Wright-Patterson Air Force Base, Dayton, Ohio 45433
H. Wu
Affiliation:
School of Engineering, Coventry University, Coventry CV1 5FB, United Kingdom
C.R.M. Grovenor
Affiliation:
Department of Materials, University of Oxford, Oxford OX1 3PH, United Kingdom
J.C. Bilello
Affiliation:
Center for Nanomaterials Science, Department of Materials Science and Engineering,University of Michigan, Ann Arbor, Michigan 48109-2136
*
a)Address all correspondence to this author. e-mail: mdaniels@umich.edu
Get access

Abstract

An as-deposited Al–Cu–Fe–Cr film was annealed in flowing argon to study development of a quasicrystalline approximant microstructure. Sputter profile x-ray photoemission spectroscopy analysis showed oxygen incorporation reached approximately 70 at.% at the surface of the film, declined monotonically, and stabilized at ∼10 at.% at a depth of 160 nm. Synchrotron grazing incidence x-ray scattering was used to probe the structure of the coating at various penetration depths by altering the angle of the incident x-ray beam. An amorphous structure was observed near the termination surface, which coexisted with a compressively strained crystalline aluminum. These phases were the dominant microstructure to a depth of 110 nm. Below 150 nm, the film was primarily O1 decagonal approximant. Cross-section transmission electron microscopy elucidated a columnar growth morphology with associated porosity in the interstices between the columns. The resulting development of the Al–Cu–Fe–Cr decagonal approximant coatings from the precursor is reported.

Keywords

AnnealingPhysical vapor deposition (PVD)Quasicrystal
Type
Articles
Information
Journal of Materials Research , Volume 20 , Issue 1 , January 2005 , pp. 176 - 182
Copyright
Copyright © Materials Research Society 2004

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1Bresson, L. and Gratias, D.: Plastic deformation in AlCuFe icosohedral phase. J. Non-Cryst. Solids 153, 468 (1993).CrossRefGoogle Scholar
2Tsai, A.P., Inoue, A. and Yokoyama, Y.: New icosohedral alloys with superlattice order in the Al–Pd-Mn system prepared by rapid solidification. Philos. Mag. Lett. 61, 9 (1990).CrossRefGoogle Scholar
3Dong, C. and Dubois, J.M.: Quasicrystals and crystalline phases in Al65Cu20Fe10Cr5. J. Mater. Sci. 26, 1647 (1991).CrossRefGoogle Scholar
4Eisenhammer, T. and Trampert, A.: Formation of quasicrystalline AlCuFe by physical vapor deposition: Phase selection via nanocluster nucleation. Phys. Rev. Lett. 78, 262 (1997).CrossRefGoogle Scholar
5Eisenhammer, T., Mahr, A., Haugeneder, A., Assmann, W., and Reichelt, T.: Deposition of thin quasicrystalline AlCuFe films for solar solective absorbers, in Proc. 5th Int. Conf. On Quasicrystals, edited by Janot, C. and Mosseri, R. (World Scientific, Singapore, 1995), p. 758.Google Scholar
6Follstaedt, D.M. and Knapp, J.A.: Icosohedral phase formation by solid state interdiffusion. Phys. Rev. Lett. 56, 1827 (1986).CrossRefGoogle Scholar
7Ding, Y., Northwood, D.O. and Alpas, A.T.: Fabrication by magnetron sputtering of Al–Cu–Fe quasicrystalline films for tribological applications. Surf. Coat. Technol. 96, 140 (1997).CrossRefGoogle Scholar
8Yoshioka, A., Edagawa, K., Kimura, K. and Takeuchi, S.: Production of high-quality thin-film samples of Al–Cu–Fe icosohedral quasicrystal. Jpn. J. Appl. Phys. 34, 1606 (1995).CrossRefGoogle Scholar
9Haugeneder, A., Eisenhammer, T., Mahr, A., Schneider, J. and Wendel, M.: Oxidation of quasicrystalline and crystalline AlCuFe thin films in air. Thin Solid Films 307, 120 (1997).CrossRefGoogle Scholar
10Pinhero, P.J., Anderegg, J.W., Sordelet, D.J., Besser, M.F. and Thiel, P.A.: Surface oxidation of Al–Cu–Fe alloys: A comparison of quasicrystalline and crystalline phases. Philos. Mag. B 79, 91 (1999).CrossRefGoogle Scholar
11Pinhero, P.J., Anderegg, J.W., Sordelet, D.J., Lograsso, T.A., Delaney, D.W. and Thiel, P.A.: Surface oxidation of a quasicrystalline Al–Cu–Fe alloy: No effect of surface orientation and grain boundaries on the final state. J. Mater. Res. 14, 3185 (1999).CrossRefGoogle Scholar
12Gil-Gavatz, M., Rouxel, D., Pigeat, P., Weber, B. and Dubois, J.M. Study of Al surface segregation in icosahedral Al62Co255Fe125 in Quasicrystals , edited by Dubois, J-M., Thiel, P.A., Tsai, A-P., and Urban, K. (Mater. Res. Soc. Symp. Proc., 553, Warrendale, PA, 1999), p. 75.Google Scholar
13Gullikson, E. In Vacuum Ultraviolet Spectroscopy: Experimental Methods in the Physical Sciences , edited by Samson, J.A. and Ederer, D.L. (Academic Press, San Diego, CA, 1998), p. 257.CrossRefGoogle Scholar
14Henke, B.L., Gullikson, E.M., Davis, J.C.: X-ray interactions: Photoabsorption, scattering, transmission, and reflection at E = 50-30000 eV, Z = 1-92. Atomic Data and Nuclear Data Tables 54, 181 (1993).CrossRefGoogle Scholar
15Dubois, J.M., Kang, S.S., Archambault, P. and Colleret, B.: Thermal diffusivity of quasicrystalline and related crystalline alloys. J. Mater. Res. 8, 38 (1993).CrossRefGoogle Scholar
16Kato, N.I., Miura, N. and Tsutsui, N.: Plasma-polymerized protective film for transmission-electron-microscopy-specimen preparation by focused ion beam etching. J. Vac. Sci. Technol. A 16, 1127 (1998).CrossRefGoogle Scholar
17Overwijk, M.H.F., van den Heuvel, F.C. and Bulle-Lieuwma, C.W.T.: Novel scheme for the preparation of transmission electron microscopy specimens with the focused ion beam. J. Vac. Sci. Technol. B 11, 202 (1993).Google Scholar
18Rubanov, S. and Munroe, P.R.: Investigation of the structure of damage layers in TEM samples prepared using a focused ion beam. J. Mater. Sci. Lett. 20, 1181 (2001).CrossRefGoogle Scholar
19Graupner, H., Hammer, L., Mueller, K. and Zehner, D.M.: Composition and structure of the (100) and (110) surfaces of FeAl. Surf. Sci. 322, 103 (1995).CrossRefGoogle Scholar
20Chang, S.L., Chin, W.B., Zhang, C.M., Jenks, C.J. and Thiel, P.A.: Oxygen adsorption on a single-grain, quasicrystal surface. Surf. Sci. 337, 135 (1995).CrossRefGoogle Scholar
21Dubois, J.M., Proner, A., Bucaille, B., Cathonnet, Ph., Dong, C., Richard, V., Pianelli, A., Massiani, Y., Ait-Yaazza, S. and Berlin-Ferre, E.: Quasicrystalline coatings with reduced adhesion for cookware. Ann. Chimie-Sci. Mater. France 19, 3 (1994).Google Scholar
22Roth, C., Schwalbe, G., Knöfler, R., Zavaliche, F., Madel, O., Haberkern, R. and Häussler, P.: A detailed comparison between the amorphous and quasicrystalline state of Al–Cu–Fe. J. Non-Cryst. Solids 252, 869 (1999).CrossRefGoogle Scholar
23Haberkern, R., Roth, C., Knöfler, R., Schulze, L. and Häussler, P.: Fabrication of high quality QC films via the route of the amorphous phase, in Quasicrystals , edited by Dubois, J-M., Thiel, P.A., Tsai, A-P., and Urban, K. (Mater. Res. Soc. Symp. Proc., 553, Warrendale, PA, 1999), p. 13.Google Scholar
24Li, X.Z., Dong, C. and Dubois, J.M.: Structural study of crystalline approximants of the Al–Cu–Fe–Cr decagonal quasicrystal. J. Appl. Crystallogr. 28, 96 (1995).CrossRefGoogle Scholar
25Fehrenbacher, L., Zabinski, J.S., Phillips, B.S., Daniels, M.J., King, D., Ketola, K.S. and Bilello, J.C.: Microstructure development and tribological behavior of AlCuFe quasicrystalline thin films. Tribol. Lett. 17, 435 2004 .CrossRefGoogle Scholar
26Grovenor, C.R.M., Hentzell, H.T.G. and Smith, D.A.: Development of grain structure during growth of metallic films. Acta Metall. 32, 773 (1984).CrossRefGoogle Scholar
27Thornton, J.A.: High rate thick film growth. Ann. Rev. Mater. Sci. 7, 239 (1977).CrossRefGoogle Scholar
28Cullity, B.D.: Elements of X-ray Diffraction, 2nd ed. (Addison-Wesley Publishing Co., Reading, MA, 1978), p. 102.Google Scholar
29Daniels, M.J., Maciejewski, J., Zabinski, J.S., Rek, Z.U., Yalisove, S.M. and Bilello, J.C.: An investigation of sputtered Al-Cu-Fe-Cr quasicrystalline films via synchrotron diffraction, in Quasicrystals–Preparation, Properties, and Applications , edited by Berlin-Ferré, E., Thiel, P.A., Tsai, A-P, and Urban, K. (Mater, Res. Soc. Symp. Proc., 643, Warrendale, PA, 2001), p. K8.4.1.Google Scholar