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Microstructures, surface areas, and oxygen absorption of Ti and Ti–Zr–V films grown using glancing-angle sputtering

Published online by Cambridge University Press:  31 January 2011

Chien-Cheng Li
Affiliation:
Department of Materials Science and Engineering, National Cheng Kung University, Tainan 701, Taiwan, Republic of China
Jow-Lay Huang
Affiliation:
Department of Materials Science and Engineering, National Cheng Kung University, Tainan 701, Taiwan, Republic of China
Ran-Jin Lin
Affiliation:
Intellectual Property Exchange Limited, Hsinchu 310, Taiwan, Republic of China
Hong-Ping Lin
Affiliation:
Department of Chemistry, National Cheng Kung University, Tainan 701, Taiwan, Republic of China
Ding-Fwu Lii
Affiliation:
Department of Electrical Engineering, Cheng Shiu University, Kaohsiung 833, Taiwan, Republic of China
Chuan-Pu Liu
Affiliation:
Department of Materials Science and Engineering, National Cheng Kung University, Tainan 701, Taiwan, Republic of China
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Abstract

Highly porous Ti and TiZrV getter film coatings have been successfully grown on (100) silicon substrates using the glancing-angle direct-current magnetron sputtering method. The evolution of the microstructures of the Ti and the TiZrV films strongly depends on the sputtering flux rate, surface diffusion rate, nucleation rate, compositions, and self-shadowing geometry of the nuclei on the sputtering flux. The larger the glancing angle, the higher the porosity and specific surface area of the Ti and TiZrV films. The weight-gain results strongly depend on several factors, such as specific surface area, the surface structure of the getter film, the diffusion rate of O in the getter film, the reactivity of Ti, Zr, and V on O, and the order of the stabilities of Ti, Zr, and V oxides on the film’s surface. Porous Ti film absorbs oxygen better than porous TiZrV film does due to its higher surface area and the high diffusion rate of O in Ti films.

Type
Articles
Copyright
Copyright © Materials Research Society 2007

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References

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