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Optical and electrical properties of transparent conducting In2O3–ZrO2 films

Published online by Cambridge University Press:  31 January 2011

S. B. Qadri
Affiliation:
United States Naval Research Laboratory, Washington, District of Columbia 20375-5000
H. Kim
Affiliation:
George Washington University, Washington, District of Columbia
H. R. Khan
Affiliation:
Forschungsinstitut für Edelmetalle und Metallchemie (FEM), 73525 Schwäbisch Gmünd, Germany
A. Piqué
Affiliation:
United States Naval Research Laboratory, Washington, District of Columbia 20375-5000
J. S. Horwitz
Affiliation:
United States Naval Research Laboratory, Washington, District of Columbia 20375-5000
D. Chrisey
Affiliation:
United States Naval Research Laboratory, Washington, District of Columbia 20375-5000
E. F. Skelton
Affiliation:
United States Naval Research Laboratory, Washington, District of Columbia 20375-5000
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Extract

The optical transparencies and electrical conductivities of thin films of In2O3 mixed with ZrO2 have been investigated. These films were deposited on glass substrates at room temperature using pulsed-laser deposition. Indium–zirconium oxide films with a ZrO2 content up to a 15 wt% were conducting and more than 80% transparent from 450 to 700 nm. As the ZrO2 content increased from 0 to 15 wt%, the electrical resistivities increased from 1.28 × 10−3 to 6.48 × 10−2 Ω cm, the carrier densities were decreased from 2.14 × 1020 to 1.0 × 1018/cm3, and the Hall mobilities decreased from 21 to 5 cm2 V−1 s−1, all monotonically.

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Articles
Copyright
Copyright © Materials Research Society 2000

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References

REFERENCES

1.Dawar, A.L. and Joshi, J.C., J. Mater. Sci. 19, 1 (1984).Google Scholar
2.Chopra, K.L., Major, S., and Pandya, D.K., Thin Solid Films, 102, 1 (1983).CrossRefGoogle Scholar
3.Yamamoto, S., Yamanaka, T., and Ueda, Z., J. Vac. Sci. Technol. A5, 1957 (1987).Google Scholar
4.Minami, T., Sato, H., Nanto, H., and Takata, S., Jpn. J. Appl. Phys. 24, L781 (1985).Google Scholar
5.Mott, N.F. and Gurney, R.W., Electronic Processes in Ionic Crystals (Oxford Univ. Press, London and New York, 1948).Google Scholar
6.Aitchison, R.E., Aust. J. Appl. Sci. 5, 10 (1954).Google Scholar
7.Verwey, E.J., Haiijman, P.W., Romeijn, F.C., and Van Oosterhut, G.W., Philips Res. Rep. 5, 173 (1950).Google Scholar
8.Kofstad, P., Nonstoichiometry, Diffusion, and Electrical Conductivity in Binary Metal Oxides (Wiley, New York, 1972).Google Scholar
9.Wagner, C., J. Phys. Chem. Solids 33, 105 (1972).Google Scholar
10.Kim, H., Piqué, A., Horwitz, J.S., Mattoussi, H., Murata, H., Kafafi, Z.H., and Chrisey, D.B., Appl. Phys. Lett. 74, 3444 (1999).Google Scholar
11.Coutal, C., Azema, A., and Roustan, J-C., Thin Solid Films 288, 248 (1996).Google Scholar
12.Qadri, S.B., Skelton, E.F., Lubitz, P., Nguyen, N.V., and Khan, H.R., Thin Solid Films 290–291, 80 (1996).Google Scholar
13.Qadri, S.B., Skelton, E.F., Harford, M.Z., Jones, R., and Lubitz, P., J. Vac. Sci. Technol. A9, 510 (1991).CrossRefGoogle Scholar
14.Qadri, S.B., Khan, H.R., Skelton, E.F., and Lubitz, P., Surf. Coat. Technol. 100–101, 94 (1998).CrossRefGoogle Scholar
15.Teufer, G., Acta Crystallogr. 15, 1187 (1962).Google Scholar
16.Subba Rao, E.C., in Science and Technology of Zirconia, Advances in Ceramics Vol. 3, edited by Heuer, A.H. and Hobbs, L.W. (American Ceramic Society, Columbus, OH, 1981), pp. 124.Google Scholar
17. JCPDS Card No. 06-0416.Google Scholar
18.Ploc, R.A., Proc. Annu. Meet. Microsc. Soc. Can. VII, 34 (1980).Google Scholar
19.Weiher, R.L. and Ley, R.P., J. Appl. Phys. 37, 299 (1966).Google Scholar
20.Hamberg, I. and Granqvist, C.G., J. Appl. Phys. 60, R123 (1986).Google Scholar
21.Emeline, A., Kataeva, G.V., Litke, A.S., Rudakova, A.V., Ryabchuk, V.K., and Serpone, N., Langmuir 14, 50115022 (1998).Google Scholar
22.Sanz, J.M., Gonzalez-Elipe, A.R., Fernandez, A., Leinen, D., Galan, L., Stampe, A., and Bradshaw, A.M., Surf. Sci. 307–309, 848 (1994).Google Scholar
23.Hartnagel, H.L., Dawar, A.L., Jain, A.K., and Jagadish, C., Semiconducting Transparent Thin Films (Institute of Physics Publishing, Bristol and Philadelphia, 1995).Google Scholar