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Ordered and twinned multidomain structure in highly Al-rich mullite

Published online by Cambridge University Press:  31 January 2011

H.Z. Wang ,
T. Kulkarni ,
V.K. Sarin  and
S.N. Basu
H.Z. Wang
Affiliation:
Department of Manufacturing Engineering, College of Engineering, Boston University, Brookline, Massachusetts 02446
T. Kulkarni
Affiliation:
Department of Manufacturing Engineering, College of Engineering, Boston University, Brookline, Massachusetts 02446
V.K. Sarin
Affiliation:
Department of Manufacturing Engineering, College of Engineering, Boston University, Brookline, Massachusetts 02446
S.N. Basu*
Affiliation:
Department of Manufacturing Engineering, College of Engineering, Boston University, Brookline, Massachusetts 02446
*
a)Address all correspondence to this author. e-mail: basu@bu.edu
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Abstract

The structure of a region of a highly Al-rich mullite (Al4+2xSi2–2xO10–x with x ∼ 0.82; 47Al2O3-6SiO2; Al/Si ∼16) in a chemically vapor-deposited, functionally graded mullite coating was studied by high-resolution transmission electron microscopy. The region consisted of a fully ordered and twinned multidomain structure. Within each domain, well-ordered oxygen vacancies resulted in antiphase boundaries (APBs) characterized by a shift vector of [001]. The APBs were oriented parallel to (601) and (601). Along [001], the structure consisted of alternating layers of (601)- and (601)-domains with a spacing of 17d601, separated by (001) twinning planes. The (001) twinning did not generate any additional spots in the [010] mullite diffraction pattern. The lattice parameters of this ultrahigh Al-rich mullite phase were calculated from selected-area electron-diffraction patterns to be: a = 0.762 nm; b = 0.754 nm; and c = 0.291 nm.

Keywords

Chemical vapor deposition (CVD) (deposition)StructuralTransmission electron microscopy (TEM)
Type
Articles
Information
Journal of Materials Research , Volume 22 , Issue 11 , November 2007 , pp. 3210 - 3217
Copyright
Copyright © Materials Research Society 2007

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