Hostname: page-component-78c5997874-94fs2 Total loading time: 0 Render date: 2024-11-13T01:45:36.052Z Has data issue: false hasContentIssue false
  • English
  • Français

Preparation of heterosiloxanes containing Zr and Hf and their use as precursors to refractory materials

Published online by Cambridge University Press:  31 January 2011

Duane C. Hrncir  and
Gary D. Skiles
Duane C. Hrncir*
Affiliation:
Department of Chemistry, University of Texas at Dallas, Richardson, Texas 75083
Gary D. Skiles
Affiliation:
Department of Chemistry, University of Texas at Dallas, Richardson, Texas 75083
*
a)Author to whom correspondence should be addressed.
Get access

Abstract

Metallasiloxanes of the type, M (OSiR3)4, which contain zirconium and hafnium can be prepared by the facile silanol-induced cleavage of organometallic compounds. The metallasiloxanes vary from mobile liquids to insoluble nonmelting powders depending upon the constituents bonded to the silicon. The compounds can be fired into inorganic refractory oxides at temperatures varying from 350–600 °C. The resulting materials have the general formula M Si4O10. Electron spectroscopy for chemical analysis (ESCA) data suggest that the M-O–Si linkage remains intact during this process. Thus the M Si4O10 material can be considered a mixed oxide alloy rather than a simple mixture of the oxides M O2 and SiO2.

Type
Rapid Communications
Information
Journal of Materials Research , Volume 3 , Issue 3 , June 1988 , pp. 410 - 412
Copyright
Copyright © Materials Research Society 1988

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1Noll, W., Chemistry and Technology of Silicones (Academic, New York, 1968).Google Scholar
2Lynch, W., Handbook of Silicone Rubber Fabrication (Van Nostrand-Reinhold, New York, 1978).Google Scholar
3Schindler, F. and Schmidbaur, H., Angew. Chem. Int. Ed. Eng. 6, 683 (1967).CrossRefGoogle Scholar
4Andvianov, K. A. and Asnovich, E. Z., Vysokomol. Soedin. 1, 743 (1959).Google Scholar
5Babaian, E. A., Hrncir, D. C., Bott, S. G., and Atwood, J. L., Inorg. Chem. 25, 4818 (1986).Google Scholar
6Morris, G. A. and Freeman, R., J. Am. Chem. Soc. 101, 760 (1979).Google Scholar
7Bradley, D. C. and Thomas, I. M., J. Chem. Soc. 1959, 3404.Google Scholar
8Sliihara, I., Schwarz, W. T., and Post, H. W., Chem. Rev. 61, 1 (1961).CrossRefGoogle Scholar
9Gutmann, V. and Meller, A., Mh. Chem. 91, 519 (1960).Google Scholar