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Reactions of silicon tetrachloride and germanium tetrachloride with oxygen and oxides of nitrogen

Published online by Cambridge University Press:  31 January 2011

R. M. Atkins  and
V. A. Hohan
R. M. Atkins
Affiliation:
AT & T Bell Laboratories, Murray Hill, New Jersey 07974
V. A. Hohan*
Affiliation:
AT & T Bell Laboratories, Murray Hill, New Jersey 07974
*
a)Bell Laboratories Summer Research Program Participant, 1986.
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Abstract

The reactions of SiCl4 and GeCl4 with oxygen and oxides of nitrogen have been studied in a continuous flow system. SiCl4 is found to react with nitrous oxide at a considerably lower temperature (700 °C vs 1050 °C) than with oxygen. In both cases the formation of silicon oxychlorides (hexachlorodisiloxane and octachlorocyclo-tetrasiloxane) was observed for the first 300 °C after reaction initiates. Activation energies of 115 kcal/mole and 40 kcal/mole were determined for the reactions with oxygen and nitrous oxide, respectively (under conditions of 100-fold excess oxidizer). GeCl4 is also found to react with nitrous oxide at a lower temperature than with oxygen; however, in this case no oxychloride species were observed. Activation energies of 53 kcal/mole and 48.6 kcal/mole were determined for the reactions with oxygen and nitrous oxide, respectively (under conditions of 70-fold excess oxidizer). Reactions of GeCl4 with nitric oxide and nitrogen dioxide are also reported. The use of N2O as an oxidant in optical fiber fabrication processes is discussed.

Type
Articles
Information
Journal of Materials Research , Volume 4 , Issue 3 , June 1989 , pp. 641 - 650
Copyright
Copyright © Materials Research Society 1989

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