Hostname: page-component-cd9895bd7-jkksz Total loading time: 0 Render date: 2024-12-30T22:22:38.746Z Has data issue: false hasContentIssue false
  • English
  • Français

Resistivity measurement of an a-axis-oriented YBa2Cu3O7–δ thin film at 450-650 °C

Published online by Cambridge University Press:  31 January 2011

Toshio Usui ,
Akira Oishi ,
Hidekazu Teshima ,
Kazumi Ohata  and
Tadataka Morishita
Toshio Usui
Affiliation:
Superconductivity Research Laboratory, ISTEC, 1-10-13 Shinonome, Koto-ku, Tokyo 135, Japan
Akira Oishi
Affiliation:
Superconductivity Research Laboratory, ISTEC, 1-10-13 Shinonome, Koto-ku, Tokyo 135, Japan
Hidekazu Teshima
Affiliation:
Superconductivity Research Laboratory, ISTEC, 1-10-13 Shinonome, Koto-ku, Tokyo 135, Japan
Kazumi Ohata
Affiliation:
Superconductivity Research Laboratory, ISTEC, 1-10-13 Shinonome, Koto-ku, Tokyo 135, Japan
Tadataka Morishita
Affiliation:
Superconductivity Research Laboratory, ISTEC, 1-10-13 Shinonome, Koto-ku, Tokyo 135, Japan
Get access

Abstract

Resistivity measurement of an a-axis-oriented YBa2Cu3O7-δ (YBCO) thin film was carried out in a stream of O2/Ar mixtures at 450–650 °C. Rapidly reversible change in the resistivity of the YBCO film was observed as a function of the oxygen partial pressure in the ambient atmosphere due to the oxygen in-/out-diffusion in the YBCO film. Resistivity measurement of YBCO thin films at higher temperatures of 450–650 °C was found to be quite effective to predict the influence of fabricating processes on the superconducting properties of YBCO films.

Type
Articles
Information
Journal of Materials Research , Volume 8 , Issue 4 , April 1993 , pp. 705 - 708
Copyright
Copyright © Materials Research Society 1993

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1Cava, R.J., Batlogg, B., Dover, R. B. Van, Murphy, D. W., Sunshine, S., Siegrist, T., Remeika, J. P., Rietman, E. A., Zahurak, S., and Espinosa, G. P., Phys. Rev. B 58, 1676 (1987).Google Scholar
2Kishio, K., Shimoyama, J., Hasegawa, T., Kitazawa, K., and Fueki, K., Jpn. J. Appl. Phys. 26, L1228 (1987).Google Scholar
3Yamaguchi, S., Terabe, K., Saito, A., Yahagi, S., and Iguchi, Y., Jpn. J. Appl. Phys. 27, L179 (1988).Google Scholar
4Park, S. I., Tsuei, C. C., and Tu, K. N., Phys. Rev. B 37, 2305 (1988).Google Scholar
5Izumi, F., Asano, H., Ishigaki, T., Takayama-Muromachi, E., Uchida, Y., Watanabe, N., and Nishikawa, T., Jpn. J. Appl. Phys. 26, L649 (1987).Google Scholar
6Izumi, F., Asano, H., Ishigaki, T., Takayama-Muromachi, E., Uchida, Y., and Watanabe, N., Jpn. J. Appl. Phys. 26, L1193 (1987).Google Scholar
7Specht, E. D., Sparks, C. J., Dhere, A. G., Brynestad, J., Cavin, O. B., and Kroeger, D. M., Phys. Rev. B 37, 7426 (1988).Google Scholar
8See Refs. 14-18 with regard to the resistivity measurements of the bulk YBCO samples at higher temperatures (>200 C). In addition, it is quite interesting that the in situ resistivity measurement technique was also used for monitoring the superconducting YBCO film formation.19200+C).+In+addition,+it+is+quite+interesting+that+the+in+situ+resistivity+measurement+technique+was+also+used+for+monitoring+the+superconducting+YBCO+film+formation.19>Google Scholar
9Hase, T., Izumi, H., Ohata, K., Suzuki, K., Morishita, T., and Tanaka, S., J. Appl. Phys. 68, 374 (1980).Google Scholar
10Izumi, H., Ohata, K., Hase, T., Suzuki, K., Morishita, T., and Tanaka, S., J. Appl. Phys. 68, 6331 (1980).Google Scholar
11Takahashi, H., Hase, T., Izumi, H., Ohata, K., Morishita, T., and Tanaka, S., Physica C 179, 291 (1991).CrossRefGoogle Scholar
12Umemura, T., Egawa, K., Wakata, M., and Yoshizaki, K., Jpn. J. Appl. Phys. 28, L1945 (1989).Google Scholar
13Ohkubo, M., Kachi, T., Hioki, T., and Kawamoto, J., Appl. Phys. Lett. 55, 899 (1989).Google Scholar
14Munakata, F., Shinohara, K., Kanesaka, H., Hirosaki, N., Okada, A., and Yamanaka, M., Jpn. J. Appl. Phys. 26, L1292 (1987).Google Scholar
15Grader, G. S., Gallagher, P. K., and Gyorgy, E. M., Appl. Phys. Lett. 51, 1115 (1987).Google Scholar
16Fiory, A.T., Gurvitch, M., Cava, R.J., and Espinosa, G.P., Phys. Rev. B 36, 7262 (1987).Google Scholar
17Yamaguchi, S., Terabe, K., Imai, A., and Iguchi, Y., Jpn. J. Appl. Phys. 27, L220 (1988).Google Scholar
18Tu, K.N., Tsuei, C.C., Park, S.I., and Levi, A., Phys. Rev. B 38, 772 (1988).Google Scholar
19Ying, Q.Y., Kim, H.S., Shaw, D.T., and Kwok, H.S., Appl. Phys. Lett. 55, 1041 (1989).Google Scholar