Hostname: page-component-78c5997874-ndw9j Total loading time: 0 Render date: 2024-11-15T02:22:16.571Z Has data issue: false hasContentIssue false
  • English
  • Français

Sputtered Nb- and Ta-doped TiO2 transparent conducting oxide films on glass

Published online by Cambridge University Press:  31 January 2011

Meagen A. Gillispie ,
Maikel F.A.M. van Hest ,
Matthew S. Dabney ,
John D. Perkins  and
David S. Ginley
Meagen A. Gillispie
Affiliation:
National Renewable Energy Laboratory, Golden, Colorado, 80401; and Iowa State University, Ames, Iowa, 50011
Maikel F.A.M. van Hest
Affiliation:
National Renewable Energy Laboratory, Golden, Colorado, 80401
Matthew S. Dabney
Affiliation:
National Renewable Energy Laboratory, Golden, Colorado, 80401
John D. Perkins*
Affiliation:
National Renewable Energy Laboratory, Golden, Colorado, 80401
David S. Ginley
Affiliation:
National Renewable Energy Laboratory, Golden, Colorado, 80401
*
a)Address all correspondence to this author. e-mail: john_perkins@nrel.gov
Get access

Abstract

Radio frequency (rf) magnetron sputtering is used to deposit Ti0.85Nb0.15O2 and Ti0.8Ta0.2O2 films on glass substrates at substrate temperatures (TS) ranging from ∼250 to 400 °C. The most conducting Nb-doped TiO2 films were deposited at TS = 370 °C, with conductivities of ∼60 S/cm, carrier concentrations of 1.5 × 1021 cm−3 and mobilities <1 cm2/V·s. The conductivity of the films was limited by the mobility, which was more than 10 times lower than the mobility for films deposited epitaxially on SrTiO3. The difference in properties is likely caused by the randomly oriented crystal structure of the films deposited on glass compared with biaxially textured films deposited on SrTiO3. The anatase phase could not be stabilized in the Ta-doped TiO2 films, likely because of the high dopant concentration.

Keywords

Transparent conductorSputteringOptical properties
Type
Articles
Information
Journal of Materials Research , Volume 22 , Issue 10 , October 2007 , pp. 2832 - 2837
Copyright
Copyright © Materials Research Society 2007

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1Ginley, D.S.Bright, C.: Transparent conducting oxides. MRS Bull. 25, 15 2000CrossRefGoogle Scholar
2Gordon, R.G.: Criteria for choosing transparent conductors. MRS Bull. 25, 52 2000CrossRefGoogle Scholar
3Haacke, G.: Transparent conducting coatings. Ann. Rev. Mater. Sci. 7, 73 1977CrossRefGoogle Scholar
4Hosono, H., Ohta, H., Orita, M., Ueda, K.Hirano, M.: Frontier of transparent conductive oxide thin films. Vacuum 66, 419 2002CrossRefGoogle Scholar
5Kawazoe, H., Yanagi, H., Ueda, K.Hosono, H.: Transparent p-type conducting oxides: design and fabrication of p-n heterojunctions. MRS Bull. 25, 28 2000CrossRefGoogle Scholar
6Lewis, B.G.Paine, D.C.: Applications and processing of transparent conducting oxides. MRS Bull. 25, 22 2000CrossRefGoogle Scholar
7Mryasov, O.N.Freeman, A.J.: Electronic band structure of indium tin oxide and criteria for transparent conducting behavior. Phys. Rev. B 64, 233111 2001CrossRefGoogle Scholar
8Tahar, R.B.H., Ban, T., Ohya, Y.Takahashi, Y.: Tin doped indium oxide thin films: Electrical properties. J. Appl. Phys. 83, 2631 1998CrossRefGoogle Scholar
9Dai, C.M., Su, C.S.Chuu, D.S.: Growth of highly oriented tin oxide thin films by laser evaporation deposition. Appl. Phys. Lett. 57, 1879 1990CrossRefGoogle Scholar
10Minami, T.: New n-type transparent conducting oxides. MRS Bull. 25, 38 2000CrossRefGoogle Scholar
11Furubayashi, Y., Hitosugi, T., Yamamoto, Y., Hirose, Y., Kinoda, G., Inaba, K., Shimada, T.Hasegawa, T.: Novel transparent conducting oxide: Anatase Ti1−xNbxO2. Thin Solid Films 496, 157 2006CrossRefGoogle Scholar
12Furubayashi, Y., Hitosugi, T., Yamamoto, Y., Inaba, K., Kinoda, G., Hirose, Y., Shimada, T.Hasegawa, T.: A transparent metal: Nb-doped anatase TiO2. Appl. Phys. Lett. 86, 252101 2005CrossRefGoogle Scholar
13Hitosugi, T., Furubayashi, Y., Ueda, A., Itabashi, K., Inaba, K., Hirose, Y., Kinoda, G., Yamamoto, Y., Shimada, T.Hasegawa, T.: Ta-doped anatase TiO2 epitaxial film as transparent conducting oxide. Jpn. J. Appl. Phys. 44, L1063 2005CrossRefGoogle Scholar
14Lagnel, F., Poumellec, B., Thomas, J.P., Ziani, A.Gasgnier, M.: Preparation of amorphous thin films of (Ti,V)O2 and (Ti,Nb)O2 by R.F. sputtering. Thin Solid Films 176, 111 1989CrossRefGoogle Scholar
15Gillispie, M.A., van Hest, M., Dabney, M.S., Perkins, J.D.Ginley, D.S.: rf magnetron sputter deposition of transparent conducting Nb-doped TiO2 films on SrTiO3. J. Appl. Phys. 101, 033125 2007CrossRefGoogle Scholar
16Tang, H., Prasad, K., Sanjinès, R., Schmid, P.E.Lévy, F.: Electrical and optical properties of TiO2 anatase thin films. J. Appl. Phys. 75, 2042 1994CrossRefGoogle Scholar
17Perkins, J.D., Teplin, C.W., van Hest, M., Alleman, J.L., Li, X., Dabney, M.S., Keyes, B.M., Gedvilas, L.M., Ginley, D.S., Lin, Y.Lu, Y.: Optical analysis of thin film combinatorial libraries. Appl. Surf. Sci. 223, 124 2004CrossRefGoogle Scholar
18Okada, K., Yamamoto, N., Kameshima, Y., Yasumori, A.MacKenzie, K.J.D.: Effect of silica additive on the anatase-to-rutile phase transition. J. Am. Ceram. Soc. 84, 1591 2001CrossRefGoogle Scholar
19Shannon, R.D.Pask, J.A.: Kinetics of anatase-rutile transformation. J. Am. Ceram. Soc. 48, 391 1965CrossRefGoogle Scholar
20Tang, H., Prasad, R., Sanjinès, R.Lévy, F.: TiO2 anatase thin films as gas sensors. Sens. Actuators, B: Chem. 26–27, 71 1995CrossRefGoogle Scholar
21Wicaksana, D., Kobayashi, A.Kinbara, A.: Process effects on structural properties of TiO2 thin films by reactive sputtering. J. Vac. Sci. Technol., A 10, 1479 1992CrossRefGoogle Scholar
22Tewg, J-Y., Kuo, Y.Lu, J.: Suppression of crystallization of tantalum oxide thin film by doping with zirconium. Electrochem. Solid-State Lett. 8, G27 2005CrossRefGoogle Scholar
23Hosono, H., Kikuchi, N., Ueda, N.Kawazoe, H.: Working hypothesis to explore novel wide band gap electrically conducting amorphous oxides and examples. J. Non-Cryst. Solids 200, 165 1996CrossRefGoogle Scholar